ISSN: 2310-757X
Please use this identifier to cite or link to this item:
http://elar.urfu.ru/handle/10995/80832| Title: | Influence of the focused ion beam parameters on the etching of planar nanosized multigraphene/SiC field emitters |
| Authors: | Jityaev, I. L. Svetlichnyi, A. M. Avilov, V. I. Kots, I. N. Kolomiytsev, A. S. Ageev, O. A. |
| Issue Date: | 2018 |
| Publisher: | Ural Federal University |
| Citation: | Influence of the focused ion beam parameters on the etching of planar nanosized multigraphene/SiC field emitters / I. L. Jityaev, A. M. Svetlichnyi, V. I. Avilov, I. N. Kots, A. S. Kolomiytsev, O. A. Ageev // Scanning Probe Microscopy. Abstract Book of International Conference (Ekaterinburg, August 25-28, 2019). — Ekaterinburg, Ural Federal University, 2018. — p. 131. |
| URI: | http://elar.urfu.ru/handle/10995/80832 |
| Conference name: | International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials" |
| Conference date: | 26.08.2018-29.08.2018 |
| ISBN: | 978-5-9500624-1-4 |
| metadata.dc.description.sponsorship: | The equipment of the Collective Usage Center “Nanotechnologies” and the Research and Educational Center "Nanotechnologies" of Southern Federal University was used for this study. This work was funded by Internal grant of Southern Federal University No. VnGr-07/2017-26. |
| Origin: | International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials". — Ekaterinburg, 2018 |
| Appears in Collections: | Scanning Probe Microscopy |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 978-5-9500624-1-4_2018_091.pdf | 265,25 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.