Please use this identifier to cite or link to this item: http://hdl.handle.net/10995/80679
Title: Masking layer formation on silicon substrate by the focused ion beams method for plasma-chemical treatment
Authors: Kots, I. N.
Klimin, V. S.
Rezvan, A. A.
Polyakova, V. V.
Ageev, O. A.
Issue Date: 2018
Publisher: Ural Federal University
Citation: Masking layer formation on silicon substrate by the focused ion beams method for plasma-chemical treatment / I. N. Kots, V. S. Klimin, A. A. Rezvan, V. V. Polyakova, O. A. Ageev // Scanning Probe Microscopy. Abstract Book of International Conference (Ekaterinburg, August 25-28, 2019). — Ekaterinburg, Ural Federal University, 2018. — p. 146-147.
URI: http://hdl.handle.net/10995/80679
Conference name: International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials"
Conference date: 26.08.2018-29.08.2018
ISBN: 978-5-9500624-1-4
Origin: International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials". — Ekaterinburg, 2018
Appears in Collections:Scanning Probe Microscopy

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