ISSN: 2310-757X
Please use this identifier to cite or link to this item:
http://elar.urfu.ru/handle/10995/80679| Title: | Masking layer formation on silicon substrate by the focused ion beams method for plasma-chemical treatment |
| Authors: | Kots, I. N. Klimin, V. S. Rezvan, A. A. Polyakova, V. V. Ageev, O. A. |
| Issue Date: | 2018 |
| Publisher: | Ural Federal University |
| Citation: | Masking layer formation on silicon substrate by the focused ion beams method for plasma-chemical treatment / I. N. Kots, V. S. Klimin, A. A. Rezvan, V. V. Polyakova, O. A. Ageev // Scanning Probe Microscopy. Abstract Book of International Conference (Ekaterinburg, August 25-28, 2019). — Ekaterinburg, Ural Federal University, 2018. — p. 146-147. |
| URI: | http://elar.urfu.ru/handle/10995/80679 |
| Conference name: | International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials" |
| Conference date: | 26.08.2018-29.08.2018 |
| ISBN: | 978-5-9500624-1-4 |
| Origin: | International Conference "Scanning Probe Microscopy" ; International Workshop "Modern Nanotechnologies" ; International Youth Conference "Functional Imaging of Nanomaterials". — Ekaterinburg, 2018 |
| Appears in Collections: | Scanning Probe Microscopy |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 978-5-9500624-1-4_2018_103.pdf | 251,31 kB | Adobe PDF | View/Open |
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