Please use this identifier to cite or link to this item: http://hdl.handle.net/10995/79113
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dc.contributor.authorRezvan, A. A.en
dc.contributor.authorKlimin, V. S.en
dc.contributor.authorKots, I. N.en
dc.date.accessioned2019-12-19T12:26:13Z-
dc.date.available2019-12-19T12:26:13Z-
dc.date.issued2019-
dc.identifier.citationRezvan A. A. Formation of vacuum electronics elements by a combination of methods of focused ion beams and plasma layer etching on SiC / A. A. Rezvan, V. S. Klimin, I. N. Kots // Scanning Probe Microscopy. Russia-China Workshop on Dielectric and Ferroelectric Materials. Abstract Book of Joint International Conference (Ekaterinburg, August 25-28, 2019). — Ekaterinburg, Ural Federal University, 2019. — P. 240.en
dc.identifier.isbn978-5-9500624-2-1-
dc.identifier.urihttp://hdl.handle.net/10995/79113-
dc.description.sponsorshipThis work was supported by Grant of the President of the Russian Federation No. МК-3512.2019.8 and Southern Federal University (grant VnGr-07/2017-02). The results were obtained using the equipment of the Research and Education Center "Nanotechnologies" of Southern Federal University.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherUral Federal Universityen
dc.relation.ispartofScanning Probe Microscopy. Russia-China Workshop on Dielectric and Ferroelectric Materials. — Ekaterinburg, 2019en
dc.titleFormation of vacuum electronics elements by a combination of methods of focused ion beams and plasma layer etching on SiCen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.conference.name3rd International Conference "Scanning Probe Microscopy" ; 4th Russia-China Workshop on Dielectric and Ferroelectric Materials ; International Youth Conference "Functional Imaging of nanomaterials"en
dc.conference.date25.08.2019-28.08.2019-
local.description.firstpage240-
local.description.lastpage240-
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