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|Title:||Investigation of profiling of silicon surface by local anodic oxidation nanolithography for memristors crossbar architecture creating|
|Authors:||Polyakova, V. V.|
Kots, I. N.
Smirnov, V. A.
|Publisher:||Ural Federal University|
|Citation:||Polyakova V. V. Investigation of profiling of silicon surface by local anodic oxidation nanolithography for memristors crossbar architecture creating / V. V. Polyakova, I. N. Kots, V. A. Smirnov // Scanning Probe Microscopy. Russia-China Workshop on Dielectric and Ferroelectric Materials. Abstract Book of Joint International Conference (Ekaterinburg, August 25-28, 2019). — Ekaterinburg, Ural Federal University, 2019. — P. 232.|
|Conference name:||3rd International Conference "Scanning Probe Microscopy" ; 4th Russia-China Workshop on Dielectric and Ferroelectric Materials ; International Youth Conference "Functional Imaging of nanomaterials"|
|metadata.dc.description.sponsorship:||This work was supported by the FASIE. The work was done on the equipment of Research and Education Centre “Nanotechnology” and Collective Use Centre “Nanotechnology,” Southern Federal University.|
|Origin:||Scanning Probe Microscopy. Russia-China Workshop on Dielectric and Ferroelectric Materials. — Ekaterinburg, 2019|
|Appears in Collections:||Scanning Probe Microscopy|
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