Please use this identifier to cite or link to this item:
http://elar.urfu.ru/handle/10995/51135
Title: | Low-temperature photoluminescence of ion-implanted SiO2: Sn+ films and glasses |
Authors: | Zatsepin, A. F. Buntov, E. A. Kortov, V. S. Pustovarov, V. A. Fitting, H. -J. Schmidt, B. Gavrilov, N. V. Пустоваров, В. А. |
Issue Date: | 2012 |
Citation: | Low-temperature photoluminescence of ion-implanted SiO2: Sn+ films and glasses / A. F. Zatsepin, E. A. Buntov, V. S. Kortov, V. A. Pustovarov, H. -J. Fitting, B. Schmidt, N. V. Gavrilov // Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. — 2012. — Vol. 6. — № 4. — P. 668-672. |
Abstract: | Low-temperature photoluminescence spectroscopy with pulsed synchrotron excitation is applied to study the regularities of excitation and relaxation of both point defects and nanoparticles formed by tin implantation into SiO 2 films and glasses. It has been found that tin implantation followed by air and nitrogen annealing yields the formation of α-Sn nanoclusters and nonstoichiometric SnO x nanoparticles, while a stable phase of SnO 2 does not appear. Alternative channels of luminescence excitation are revealed for nanoclusters, including energy transfer from excitons and electron-hole pairs of the host SiO 2 matrix. © 2012 Pleiades Publishing, Ltd. |
URI: | http://elar.urfu.ru/handle/10995/51135 |
RSCI ID: | 20471870 |
SCOPUS ID: | 84865514171 |
WOS ID: | 000307342700022 |
PURE ID: | 1080996 |
ISSN: | 1027-4510 |
DOI: | 10.1134/S1027451012080198 |
Appears in Collections: | Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC |
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10.1134-S1027451012080198.pdf | 314,73 kB | Adobe PDF | View/Open |
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