Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/51135
Title: Low-temperature photoluminescence of ion-implanted SiO2: Sn+ films and glasses
Authors: Zatsepin, A. F.
Buntov, E. A.
Kortov, V. S.
Pustovarov, V. A.
Fitting, H. -J.
Schmidt, B.
Gavrilov, N. V.
Пустоваров, В. А.
Issue Date: 2012
Citation: Low-temperature photoluminescence of ion-implanted SiO2: Sn+ films and glasses / A. F. Zatsepin, E. A. Buntov, V. S. Kortov, V. A. Pustovarov, H. -J. Fitting, B. Schmidt, N. V. Gavrilov // Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. — 2012. — Vol. 6. — № 4. — P. 668-672.
Abstract: Low-temperature photoluminescence spectroscopy with pulsed synchrotron excitation is applied to study the regularities of excitation and relaxation of both point defects and nanoparticles formed by tin implantation into SiO 2 films and glasses. It has been found that tin implantation followed by air and nitrogen annealing yields the formation of α-Sn nanoclusters and nonstoichiometric SnO x nanoparticles, while a stable phase of SnO 2 does not appear. Alternative channels of luminescence excitation are revealed for nanoclusters, including energy transfer from excitons and electron-hole pairs of the host SiO 2 matrix. © 2012 Pleiades Publishing, Ltd.
URI: http://elar.urfu.ru/handle/10995/51135
RSCI ID: 20471870
SCOPUS ID: 84865514171
WOS ID: 000307342700022
PURE ID: 1080996
ISSN: 1027-4510
DOI: 10.1134/S1027451012080198
Appears in Collections:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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