Obtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Discharge

Menshakov, A. I.; Bruhanova, Y. A.; Skorynina, P. A.

doi:10.1088/1742-6596/1954/1/012032

Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/112055

Title:	Obtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Discharge
Authors:	Menshakov, A. I. Bruhanova, Y. A. Skorynina, P. A.
Issue Date:	2021
Publisher:	IOP Publishing Ltd IOP Publishing
Citation:	Menshakov A. I. Obtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Discharge / A. I. Menshakov, Y. A. Bruhanova, P. A. Skorynina // Journal of Physics: Conference Series. — 2021. — Vol. 1954. — Iss. 1. — 12032.
Abstract:	The method of TiSiCN-coatings deposition by anodic evaporation of Ti and decomposition of an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with a self-heated hollow cathode is investigated. The plasma composition was analyzed by optical emission spectroscopy. TiSiCN coatings with a thickness of up to 10 microns and a hardness of up to 30 GPa were obtained in 1.5 hours at a temperature of 400 C. © Published under licence by IOP Publishing Ltd.
Keywords:	COATINGS EVAPORATION OPTICAL EMISSION SPECTROSCOPY SILICON SILICON COMPOUNDS TITANIUM COMPOUNDS ARGON ARC DISCHARGE COATINGS DEPOSITION HEXAMETHYLDISILAZANE HOLLOW CATHODES LOW PRESSURE ARC LOW PRESSURES ORGANO-SILICON PRECURSOR PLASMA COMPOSITION NITROGEN COMPOUNDS
URI:	http://elar.urfu.ru/handle/10995/112055
Access:	info:eu-repo/semantics/openAccess
Conference name:	15th International Conference on Films and Coatings, ICFC 2021
Conference date:	18 May 2021 through 20 May 2021
SCOPUS ID:	85109287991
PURE ID:	22822864
ISSN:	1742-6588
DOI:	10.1088/1742-6596/1954/1/012032
metadata.dc.description.sponsorship:	The work was supported by the Russian Science Foundation (grant no. 20-79-10059).
RSCF project card:	20-79-10059
Appears in Collections:	Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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