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dc.contributor.authorMenshakov, A. I.en
dc.contributor.authorBruhanova, Y. A.en
dc.contributor.authorSkorynina, P. A.en
dc.date.accessioned2022-05-12T08:27:31Z-
dc.date.available2022-05-12T08:27:31Z-
dc.date.issued2021-
dc.identifier.citationMenshakov A. I. Obtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Discharge / A. I. Menshakov, Y. A. Bruhanova, P. A. Skorynina // Journal of Physics: Conference Series. — 2021. — Vol. 1954. — Iss. 1. — 12032.en
dc.identifier.issn1742-6588-
dc.identifier.otherAll Open Access, Bronze3
dc.identifier.urihttp://elar.urfu.ru/handle/10995/112055-
dc.description.abstractThe method of TiSiCN-coatings deposition by anodic evaporation of Ti and decomposition of an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with a self-heated hollow cathode is investigated. The plasma composition was analyzed by optical emission spectroscopy. TiSiCN coatings with a thickness of up to 10 microns and a hardness of up to 30 GPa were obtained in 1.5 hours at a temperature of 400 C. © Published under licence by IOP Publishing Ltd.en
dc.description.sponsorshipThe work was supported by the Russian Science Foundation (grant no. 20-79-10059).en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherIOP Publishing Ltden1
dc.publisherIOP Publishingen
dc.relationinfo:eu-repo/grantAgreement/RSF//20-79-10059en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceJ. Phys. Conf. Ser.2
dc.sourceJournal of Physics: Conference Seriesen
dc.subjectCOATINGSen
dc.subjectEVAPORATIONen
dc.subjectOPTICAL EMISSION SPECTROSCOPYen
dc.subjectSILICONen
dc.subjectSILICON COMPOUNDSen
dc.subjectTITANIUM COMPOUNDSen
dc.subjectARGON ARC DISCHARGEen
dc.subjectCOATINGS DEPOSITIONen
dc.subjectHEXAMETHYLDISILAZANEen
dc.subjectHOLLOW CATHODESen
dc.subjectLOW PRESSURE ARCen
dc.subjectLOW PRESSURESen
dc.subjectORGANO-SILICON PRECURSORen
dc.subjectPLASMA COMPOSITIONen
dc.subjectNITROGEN COMPOUNDSen
dc.titleObtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Dischargeen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.conference.name15th International Conference on Films and Coatings, ICFC 2021en
dc.conference.date18 May 2021 through 20 May 2021-
dc.identifier.doi10.1088/1742-6596/1954/1/012032-
dc.identifier.scopus85109287991-
local.contributor.employeeMenshakov, A.I., Institute of Electrophysics of the Ural Branch, Russian Academy of Sciences, 106 Amundsen St., Yekaterinburg, 620016, Russian Federation, Ural Federal University, 19 Mira St., Yekaterinburg, 620002, Russian Federation; Bruhanova, Y.A., Institute of Electrophysics of the Ural Branch, Russian Academy of Sciences, 106 Amundsen St., Yekaterinburg, 620016, Russian Federation; Skorynina, P.A., Institute of Engineering Science UB RAS, 34 Komsomolskaya str., Yekaterinburg, 620049, Russian Federationen
local.issue1-
local.volume1954-
local.contributor.departmentInstitute of Electrophysics of the Ural Branch, Russian Academy of Sciences, 106 Amundsen St., Yekaterinburg, 620016, Russian Federation; Ural Federal University, 19 Mira St., Yekaterinburg, 620002, Russian Federation; Institute of Engineering Science UB RAS, 34 Komsomolskaya str., Yekaterinburg, 620049, Russian Federationen
local.identifier.pure22822864-
local.description.order12032-
local.identifier.eid2-s2.0-85109287991-
local.fund.rsf20-79-10059-
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