Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/90494
Title: Political stability and innovation in Africa
Authors: Okrah, J.
Hajduk-Stelmachowicz, M.
Issue Date: 2020
Publisher: Centre of Sociological Research
Citation: Okrah, J. Political stability and innovation in Africa / J. Okrah, M. Hajduk-Stelmachowicz. — DOI 10.14254/2071-8330.2020/13-1/15 // Journal of International Studies. — 2020. — Vol. 1. — Iss. 13. — P. 234-246.
Abstract: This paper examines the role of institutional factors, primarily, political stability, in shaping the dynamics of innovation activity in today’s modern society. Using panel data consisting of 26 African countries from the period between 1996 and 2016 as well as employing the negative binomial estimate, we model the impact of those factors on the number of applications for patents per resident. GDP per capita, education and also other institutional factors including the rule of law and financial freedom. The results reveal a strong positive effect of the rule of law on patenting activity. © Foundation of International Studies, 2020 © CSR, 2020.
Keywords: ENTREPRENEURSHIP
INNOVATIONS
INSTITUTIONS AND ORGANISATIONS
PATENT ACTIVITIES
POLITICAL STABILITY
RULE OF LAW
URI: http://elar.urfu.ru/handle/10995/90494
Access: info:eu-repo/semantics/openAccess
SCOPUS ID: 85085621194
PURE ID: 12910666
ISSN: 2071-8330
DOI: 10.14254/2071-8330.2020/13-1/15
Sponsorship: Deutscher Akademischer Austauschdienst, DAAD
Ministry of Education and Science of the Russian Federation, Minobrnauka
Ministerstwo Nauki i Szkolnictwa Wyższego, MNiSW
The authors are thankful to the Russian Ministry of Education and Science, DAAD, The Ministry of Science and Higher Education in Poland for financial support to carry out this research. Thanks (IOS, Regensburg) for hosting James Okrah for the period of his research internship with them, with special thanks to Dr Alexander Nepp (Supervisor), Dr. Olga Popova (IOS, Regensburg), Prof. Richard Frensch (IOS, Regensburg) and Dr Stefan Huber for their support.
Appears in Collections:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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