Please use this identifier to cite or link to this item: http://hdl.handle.net/10995/27544
Title: Using high resolution and dynamic reaction cell for the improvement of the sensitivity of direct silicon determination in uranium materials by inductively coupled plasma mass spectrometry
Authors: Golik, V. M.
Kuz'mina, N. V.
Saprygin, A. V.
Trepachev, S. A.
Issue Date: 2013
Citation: Using high resolution and dynamic reaction cell for the improvement of the sensitivity of direct silicon determination in uranium materials by inductively coupled plasma mass spectrometry / V. M. Golik, N. V. Kuz'mina, A. V. Saprygin [et al.] // Journal of Analytical Chemistry. — 2013. — Vol. 68. — № 13. — P. 1142-1150.
Abstract: The paper describes solving the problem of direct silicon determination at low levels in uranium materials, caused by the spectral interferences of polyatomic ions and the high value of blank levels, using inductively coupled plasma mass spectrometry (ICP MS). To overcome the interference problem, two primary techniques have been applied: double focusing high-resolution ICP MS and dynamic reaction cell (DRC) filled with highly reactive ammonia gas. All measurements were performed at high resolution (m/Δm = 4000) on an Element-2 mass spectrometer and pressurized mode of a dynamic reaction cell on an Elan DRC II mass spectrometer. The ways to reducing background levels are investigated. The effects of operating conditions, such as plasma parameters, DRC system original parameters, and uranium matrix influence on the analytical signals of silicon at m/z = 28 have been observed for different mass spectrometer types. The detection limits and the random error characteristics (relative standard deviation) of silicon determination in uranium materials were estimated. © 2013 Pleiades Publishing, Ltd.
Keywords: DYNAMIC REACTION CELL
HIGH-RESOLUTION MASS SPECTROMETER
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY
SILICON
URANIUM HEXAFLUORIDE
WEIGHT FRACTION
DYNAMIC REACTION CELL
ERROR CHARACTERISTICS
HIGH RESOLUTION
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRIES (ICPMS)
RELATIVE STANDARD DEVIATIONS
SPECTRAL INTERFERENCE
URANIUM HEXAFLUORIDES
WEIGHT FRACTIONS
CELLS
CYTOLOGY
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY
MASS SPECTROMETERS
URANIUM
SILICON
URI: http://hdl.handle.net/10995/27544
SCOPUS ID: 84891804554
WOS ID: 000328833700008
PURE ID: 841118
ISSN: 1061-9348
DOI: 10.1134/S1061934813130066
Appears in Collections:Научные публикации, проиндексированные в SCOPUS и WoS CC

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