Please use this identifier to cite or link to this item:
http://elar.urfu.ru/handle/10995/111847
Title: | Low-Temperature Luminescence of Lead Silicate Glass |
Authors: | Zatsepin, A. F. Kukharenko, A. I. Buntov, E. A. Pustovarov, V. A. Cholakh, S. O. |
Issue Date: | 2010 |
Publisher: | Pleiades Publishing Ltd |
Citation: | Low-Temperature Luminescence of Lead Silicate Glass / A. F. Zatsepin, A. I. Kukharenko, E. A. Buntov et al. // Glass Physics and Chemistry. — 2010. — Vol. 36. — Iss. 2. — P. 166-170. |
Abstract: | The temperature quenching of intrinsic luminescence of a lead silicate glass of the 20PbO · 80SiO2 composition has been investigated in the temperature range 7-200 K. It has been found that the temperature behavior of the intensity of intrinsic luminescence does not obey the well-known Mott's law for intracenter quenching of luminescence but is adequately described by the empirical Street's formula. It has been dem-onstrated that, with allowance made for the disorder of the atomic structure, the experimental temperature dependence of the luminescence intensity of the glass can be represented as a superposition of Mott's depen-dences for an ensemble of local luminescence centers. The obtained distribution of luminescence centers over the activation energies of quenching has an asymmetric form with prevailing low-energy states. It has been assumed that this feature has a general character and, at low temperatures, determines the specificity of the processes of nonradiative relaxation of the electronic subsystem for many oxide glasses. © Pleiades Publishing, Ltd., 2010. |
Keywords: | ENERGY DISTRIBUTION OF LUMINESCENCE CENTERS LUMINESCENCE PHOTOEXCITATION RELAXATION STREET'S LAW STRUCTURAL DISORDER TEMPERATURE QUENCHING ATOMIC STRUCTURE ELECTRONIC SUBSYSTEMS INTRINSIC LUMINESCENCE LEAD SILICATE GLASS LOW TEMPERATURES LOW-ENERGY STATE LOW-TEMPERATURE LUMINESCENCE LUMINESCENCE CENTERS LUMINESCENCE INTENSITY NON-RADIATIVE RELAXATION OXIDE GLASS STREET'S LAW STRUCTURAL DISORDERS TEMPERATURE BEHAVIOR TEMPERATURE DEPENDENCE TEMPERATURE QUENCHING TEMPERATURE RANGE ACTIVATION ENERGY ELECTRIC POWER DISTRIBUTION GLASS ION BEAMS LEAD OXIDE PHOTOEXCITATION QUENCHING SILICATES |
URI: | http://elar.urfu.ru/handle/10995/111847 |
Access: | info:eu-repo/semantics/openAccess |
SCOPUS ID: | 79951566442 |
WOS ID: | 000277139600003 |
PURE ID: | 9049618 |
ISSN: | 1087-6596 |
metadata.dc.description.sponsorship: | This study was supported by the Russian Foundation for Basic Research (project nos. 09-02-00493 and 08-02-01072). |
Appears in Collections: | Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC |
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