Please use this identifier to cite or link to this item: http://hdl.handle.net/10995/103235
Title: Investigation of a new method of the organosilicon compounds activation by a low-energy electron beam for SiCN-coatings deposition
Authors: Menshakov, A.
Cholakh, S.
Issue Date: 2020
Publisher: The Japan Society of Vacuum and Surface Science
Citation: Menshakov A. Investigation of a new method of the organosilicon compounds activation by a low-energy electron beam for SiCN-coatings deposition / A. Menshakov, S. Cholakh. — DOI 10.1380/ejssnt.2020.38 // e-Journal of Surface Science and Nanotechnology. — 2020. — Vol. 18. — P. 38-40.
Abstract: The article describes a new method of organosilicon compounds activation by low energy electron beam for SiCN coatings deposition. The composition of the beam plasma in a hexamethyldisilazane-containing gas medium was studied, and it was shown that the precursor molecules decomposition degree increases with the beam current and nonmonotonically depends on the electron beam energy. The application of a low-energy electron beam for the plasma-chemical vapor decomposition of hexamethyldisilazane and for samples heating up by electron beam to 600°C makes it possible to obtain SiCN-based coatings with a hardness up to 18 GPa and thickness ~1 μm for 1 h. © 2020 The Japan Society of Vacuum and Surface Science. All rights reserved.
Keywords: LOW-ENERGY ELECTRON BEAM
POLYMER DERIVED CERAMIC
SICN COATING
ACTIVATION ENERGY
BEAM PLASMA INTERACTIONS
COATINGS
DEPOSITION
ELECTRON BEAM LITHOGRAPHY
ELECTRON BEAMS
ELECTRONS
SILICON
SILICON COMPOUNDS
BEAM CURRENTS
CHEMICAL VAPOR DECOMPOSITION
COATINGS DEPOSITION
ELECTRON BEAM ENERGY
HEXAMETHYLDISILAZANE
LOW ENERGY ELECTRON BEAMS
ORGANOSILICON COMPOUNDS
PRECURSOR MOLECULES
NITROGEN COMPOUNDS
URI: http://hdl.handle.net/10995/103235
Access: info:eu-repo/semantics/openAccess
SCOPUS ID: 85097622661
PURE ID: 12673593
ISSN: 13480391
DOI: 10.1380/ejssnt.2020.38
metadata.dc.description.sponsorship: The study was financially supported by the Russian Science Fund, grant No. 18-79-00233.
RSCF project card: 18-79-00233
Appears in Collections:Научные публикации, проиндексированные в SCOPUS и WoS CC

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