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dc.contributor.authorMorozovska, A. N.en
dc.contributor.authorEliseev, E. A.en
dc.contributor.authorIevlev, A. V.en
dc.contributor.authorVarenyk, O. V.en
dc.contributor.authorPusenkova, A. S.en
dc.contributor.authorChu, Y. -H.en
dc.contributor.authorShur, V. Y.en
dc.contributor.authorStrikha, M. V.en
dc.contributor.authorKalinin, S. V.en
dc.contributor.authorШур, В. Я.ru
dc.date.accessioned2021-08-31T15:03:37Z-
dc.date.available2021-08-31T15:03:37Z-
dc.date.issued2014-
dc.identifier.citationFerroelectric domain triggers the charge modulation in semiconductors (invited) / A. N. Morozovska, E. A. Eliseev, A. V. Ievlev, et al. — DOI 10.1063/1.4891310 // Journal of Applied Physics. — 2014. — Vol. 116. — Iss. 6. — 066817.en
dc.identifier.issn218979-
dc.identifier.otherFinal2
dc.identifier.otherAll Open Access, Green3
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84906309082&doi=10.1063%2f1.4891310&partnerID=40&md5=3237d564d5e662030f3899a339d93a5b
dc.identifier.otherhttp://arxiv.org/pdf/1312.5633m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/102433-
dc.description.abstractWe consider a typical heterostructure "domain patterned ferroelectric film - ultra-thin dielectric layer - semiconductor," where the semiconductor can be an electrolyte, paraelectric or multi-layered graphene. Unexpectedly, we have found that the space charge modulation profile and amplitude in the semiconductor, that screens the spontaneous polarization of a 180-deg domain structure of ferroelectric, depends on the domain structure period, dielectric layer thickness and semiconductor screening radius in a rather non-trivial nonlinear way. Multiple size effects appearance and manifestation are defined by the relationship between these three parameters. In addition, we show that the concept of effective gap can be introduced in a simple way only for a single-domain limit. Obtained analytical results open the way for understanding of current-AFM maps of contaminated ferroelectric surfaces in ambient atmosphere as well as explore the possibilities of conductivity control in ultra-thin semiconductor layers. © 2014 AIP Publishing LLC.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherAmerican Institute of Physics Inc.en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceJ Appl Phys2
dc.sourceJournal of Applied Physicsen
dc.subjectFERROELECTRIC FILMSen
dc.subjectFERROELECTRIC MATERIALSen
dc.subjectMODULATIONen
dc.subjectAMBIENT ATMOSPHEREen
dc.subjectANALYTICAL RESULTSen
dc.subjectCHARGE MODULATIONen
dc.subjectFERROELECTRIC DOMAINSen
dc.subjectFERROELECTRIC SURFACESen
dc.subjectMULTI-LAYERED GRAPHENEen
dc.subjectSEMICONDUCTOR LAYERSen
dc.subjectSPONTANEOUS POLARIZATIONSen
dc.subjectFERROELECTRICITYen
dc.titleFerroelectric domain triggers the charge modulation in semiconductors (invited)en
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.1063/1.4891310-
dc.identifier.scopus84906309082-
local.contributor.employeeMorozovska, A.N., Institute of Physics, National Academy of Sciences of Ukraine, 46, pr. Nauky, 03028 Kyiv, Ukraine, Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41, pr. Nauky, 03028 Kyiv, Ukraine
local.contributor.employeeEliseev, E.A., Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, 3, Krjijanovskogo, 03142 Kyiv, Ukraine
local.contributor.employeeIevlev, A.V., Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States, Ural Federal University, 51, Lenina Ave, 620000 Ekaterinburg, Russian Federation
local.contributor.employeeVarenyk, O.V., Radiophysical Faculty, Taras Shevchenko Kyiv National University, 4, pr. Akademika Hlushkova, 03022 Kyiv, Ukraine
local.contributor.employeePusenkova, A.S., Physics Faculty, Taras Shevchenko Kyiv National University, 4, pr. Akademika Hlushkova, 03022 Kyiv, Ukraine
local.contributor.employeeChu, Y.-H., Department of Material Science and Engineering, National Chiao-Tung University, Hsinchu, Taiwan, Institute of Physics, Academia Sinica, Taipei 105, Taiwan
local.contributor.employeeShur, V.Y., Ural Federal University, 51, Lenina Ave, 620000 Ekaterinburg, Russian Federation
local.contributor.employeeStrikha, M.V., Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41, pr. Nauky, 03028 Kyiv, Ukraine
local.contributor.employeeKalinin, S.V., Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States
local.issue6-
local.volume116-
dc.identifier.wos000341179400095-
local.contributor.departmentInstitute of Physics, National Academy of Sciences of Ukraine, 46, pr. Nauky, 03028 Kyiv, Ukraine
local.contributor.departmentInstitute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41, pr. Nauky, 03028 Kyiv, Ukraine
local.contributor.departmentInstitute for Problems of Materials Science, National Academy of Sciences of Ukraine, 3, Krjijanovskogo, 03142 Kyiv, Ukraine
local.contributor.departmentCenter for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States
local.contributor.departmentUral Federal University, 51, Lenina Ave, 620000 Ekaterinburg, Russian Federation
local.contributor.departmentRadiophysical Faculty, Taras Shevchenko Kyiv National University, 4, pr. Akademika Hlushkova, 03022 Kyiv, Ukraine
local.contributor.departmentPhysics Faculty, Taras Shevchenko Kyiv National University, 4, pr. Akademika Hlushkova, 03022 Kyiv, Ukraine
local.contributor.departmentDepartment of Material Science and Engineering, National Chiao-Tung University, Hsinchu, Taiwan
local.contributor.departmentInstitute of Physics, Academia Sinica, Taipei 105, Taiwan
local.identifier.purea269de16-2260-45a9-bae8-cf11f05225eeuuid
local.identifier.pure412790-
local.description.order066817-
local.identifier.eid2-s2.0-84906309082-
local.identifier.wosWOS:000341179400095-
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