Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/102265
Title: Pleomorphic structural imperfections caused by pulsed Bi-implantation in the bulk and thin-film morphologies of TiO 2
Authors: Zatsepin, D. A.
Boukhvalov, D. W.
Kurmaev, E. Z.
Gavrilov, N. V.
Kim, S. S.
Zhidkov, I. S.
Issue Date: 2016
Publisher: Elsevier B.V.
Citation: Pleomorphic structural imperfections caused by pulsed Bi-implantation in the bulk and thin-film morphologies of TiO 2 / D. A. Zatsepin, D. W. Boukhvalov, E. Z. Kurmaev, et al. — DOI 10.1016/j.apsusc.2016.04.045 // Applied Surface Science. — 2016. — Vol. 379. — P. 223-229.
Abstract: The results of combined experimental and theoretical study of pleomorphic substitutional and clustering effects in Bi-doped TiO 2 hosts (bulk and thin-film morphologies) are presented. Bi-doping of the bulk and thin-film titanium dioxide was made with help of pulsed ion-implantation (E Bi + = 30 keV, D = 1 × 10 17 cm -2 ) without posterior tempering. The X-ray photoelectron spectroscopy (XPS) qualification (core-levels and valence bands) and Density-Functional Theory (DFT) calculations were employed in order to study the electronic structure of Bi-ion implanted TiO 2 samples. According to XPS data obtained and DFT calculations, the Bi → Ti cation substitution occurs in Bi-implanted bulk TiO 2 , whereas in the thin-film morphology of TiO 2 :Bi the Bi-atoms have metal-like clusters segregation tendency. Based on the combined XPS and DFT considerations the possible reasons and mechanism for the observed effects are discussed. It is believed that established peculiarities of bismuth embedding into employed TiO 2 hosts are mostly the sequence of pleomorphic origin for the formed "bismuth-oxygen" chemical bonding. © 2016 Elsevier B.V. All rights reserved.
Keywords: AGGREGATION
BISMUTH OXIDE
DFT
ION IMPLANTATION
TITANIUM DIOXIDE
AGGLOMERATION
CHEMICAL BONDS
DENSITY FUNCTIONAL THEORY
ELECTRONIC STRUCTURE
ION IMPLANTATION
IONS
MORPHOLOGY
SEMICONDUCTOR DOPING
THIN FILMS
TITANIUM DIOXIDE
TITANIUM OXIDES
X RAY PHOTOELECTRON SPECTROSCOPY
BISMUTH OXIDES
CATION SUBSTITUTIONS
CHEMICAL BONDINGS
CLUSTERING EFFECT
DFT CALCULATION
STRUCTURAL IMPERFECTIONS
THEORETICAL STUDY
THIN FILM MORPHOLOGY
BISMUTH COMPOUNDS
URI: http://elar.urfu.ru/handle/10995/102265
Access: info:eu-repo/semantics/openAccess
SCOPUS ID: 84964330406
WOS ID: 000376819300029
PURE ID: a28fbde1-3b48-4193-97db-cf6d78512645
797211
ISSN: 1694332
DOI: 10.1016/j.apsusc.2016.04.045
Appears in Collections:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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