Пожалуйста, используйте этот идентификатор, чтобы цитировать или ссылаться на этот ресурс:
https://elar.urfu.ru/handle/10995/101389
Полная запись метаданных
Поле DC | Значение | Язык |
---|---|---|
dc.contributor.author | Galashev, A. Y. | en |
dc.contributor.author | Rakhmanova, O. R. | en |
dc.date.accessioned | 2021-08-31T14:56:53Z | - |
dc.date.available | 2021-08-31T14:56:53Z | - |
dc.date.issued | 2020 | - |
dc.identifier.citation | Galashev A. Y. Erratum to: Stability of a Two-Layer Silicene on a Nickel Substrate upon Intercalation of Lithium (Glass Physics and Chemistry, (2020), 46, 4, (321-328), 10.1134/S1087659620040069) / A. Y. Galashev, O. R. Rakhmanova. — DOI 10.1134/S108765962030001X // Glass Physics and Chemistry. — 2020. — Vol. 46. — Iss. 5. — P. 440-. | en |
dc.identifier.issn | 10876596 | - |
dc.identifier.other | Final | 2 |
dc.identifier.other | All Open Access, Bronze | 3 |
dc.identifier.other | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85092630888&doi=10.1134%2fS108765962030001X&partnerID=40&md5=1861d2443143c372d76beff6debaf0a8 | |
dc.identifier.other | https://link.springer.com/content/pdf/10.1134/S108765962030001X.pdf | m |
dc.identifier.uri | http://elar.urfu.ru/handle/10995/101389 | - |
dc.description.abstract | The title of the article should read as follows: Stability of a Two-Layer Silicene on a Nickel Substrate upon Intercalation of Lithium. Corresponding author of the article and his e-mail should read as follows: A.Y. Galashev; e-mail: alexander-galashev@yandex.ru. The original article can be found online at https://doi.org/10.1134/S1087659620040069 © 2020, Pleiades Publishing, Ltd. | en |
dc.description.sponsorship | Dr. Gill reports grants from Astellas, personal fees from Astellas, and personal fees from Sanofi, outside the submitted work. Dr. Kim reports grants from Astellas Pharma Canada, and grants from Pfizer Canada, outside the submitted work. Dr. Knoll reports grants from Astellas Canada, outside the submitted work. All of the remaining authors have nothing to disclose. | en |
dc.format.mimetype | application/pdf | en |
dc.language.iso | en | en |
dc.publisher | Pleiades journals | en |
dc.rights | info:eu-repo/semantics/openAccess | en |
dc.source | Glass Phys. Chem. | 2 |
dc.source | Glass Physics and Chemistry | en |
dc.title | Erratum to: Stability of a Two-Layer Silicene on a Nickel Substrate upon Intercalation of Lithium (Glass Physics and Chemistry, (2020), 46, 4, (321-328), 10.1134/S1087659620040069) | en |
dc.type | Erratum | en |
dc.type | info:eu-repo/semantics/publishedVersion | en |
dc.identifier.rsi | 45329747 | - |
dc.identifier.doi | 10.1134/S108765962030001X | - |
dc.identifier.scopus | 85092630888 | - |
local.contributor.employee | Galashev, A.Y., Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences, Yekaterinburg, 620990, Russian Federation, Ural Federal University, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Rakhmanova, O.R., Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences, Yekaterinburg, 620990, Russian Federation, Ural Federal University, Yekaterinburg, 620002, Russian Federation | |
local.description.firstpage | 440 | - |
local.issue | 5 | - |
local.volume | 46 | - |
dc.identifier.wos | 000579286000013 | - |
local.contributor.department | Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences, Yekaterinburg, 620990, Russian Federation | |
local.contributor.department | Ural Federal University, Yekaterinburg, 620002, Russian Federation | |
local.identifier.pure | 009054ad-7697-45fa-a223-0f1466c4de0a | uuid |
local.identifier.pure | 14151288 | - |
local.identifier.eid | 2-s2.0-85092630888 | - |
local.identifier.wos | WOS:000579286000013 | - |
Располагается в коллекциях: | Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC |
Файлы этого ресурса:
Файл | Описание | Размер | Формат | |
---|---|---|---|---|
2-s2.0-85092630888.pdf | 77,88 kB | Adobe PDF | Просмотреть/Открыть |
Все ресурсы в архиве электронных ресурсов защищены авторским правом, все права сохранены.