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dc.contributor.authorMaskaeva, L. N.en
dc.contributor.authorKutyavina, A. D.en
dc.contributor.authorPozdin, A. V.en
dc.contributor.authorMiroshnikov, B. N.en
dc.contributor.authorMiroshnikova, I. N.en
dc.contributor.authorMarkov, V. F.en
dc.date.accessioned2021-03-01T14:42:46Z-
dc.date.available2021-03-01T14:42:46Z-
dc.date.issued2020-
dc.identifier.citationAnnealing effect on temperature stability and mechanical stress at the “CdxPb1−xS film — substrate” interface / L. N. Maskaeva, A. D. Kutyavina, A. V. Pozdin, B. N. Miroshnikov, I. N. Miroshnikova, V. F. Markov // Chimica Techno Acta. — 2020. — Vol. 7, No. 4. — P. 250–258.en
dc.identifier.issn2409-5613 (Print)-
dc.identifier.issn2411-1414 (Online)-
dc.identifier.urihttp://elar.urfu.ru/handle/10995/96237-
dc.descriptionReceived: 12.10.2020. Accepted: 27.12.2020. Published:30.12.2020.en
dc.description.abstractThe article establishes the upper temperature steadiness limit of СdxPb1‑xS supersaturated solid solutions obtained by chemical bath deposition. СdxPb1‑xS (x = 0.06; 0.122; 0.176) and (x = 0.02–0.05) films remained stable under the heating up to 405– 410 and 450 K, respectively. SEM studies have shown that heating of СdxPb1‑xS films (x = 0.02–0.05) to 620 K leads to the structure destruction. Internal mechanical compressive stresses at the “СdxPb1‑xS film-substrate” interface was calculated in the range of 300–900 K for the first time ever, the highest values reached 2000–2750 kN/m2 for a number of the films compositions. In contrast to solid solutions, the expansion stresses up to 100 kN/m2 were derived for the CdS layer at 900 K. The obtained temperature steadiness boundaries and the mechanical stresses of СdxPb1‑xS films must be taken into account in the development of photonic devices based on such materials.en
dc.description.sponsorshipThe research was supported by RFBR, projects No. 20‑48‑660041r_a and No. 18‑29‑11051mk, and was carried out within the state assignment of Ministry of Science and Higher Education of the Russian Federation (theme No. Н687.42Б.223/20).en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherУральский федеральный университетru
dc.relation.ispartofChimica Techno Acta. 2020. Vol. 7. № 4en
dc.subjectCHEMICAL BATH DEPOSITION (CBD)en
dc.subjectTHIN FILMSen
dc.subjectCDXPB1−XS SOLID SOLUTIONSen
dc.subjectANNEALINGen
dc.subjectMECHANICAL STRESSen
dc.titleAnnealing effect on temperature stability and mechanical stress at the “CdxPb1−xS film — substrate” interfaceen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.rsihttps://elibrary.ru/item.asp?id=44784602-
dc.identifier.doi10.15826/chimtech.2020.7.4.20-
local.contributor.employeeМаскаева, Лариса Николаевнаru
local.contributor.employeeКутявина, Анастасия Дмитриевнаru
local.contributor.employeeПоздин, Андрей Владимировичru
local.contributor.employeeМарков, Вячеслав Филипповичru
local.description.firstpage250-
local.description.lastpage258-
local.issue4-
local.volume7-
local.fund.rffi20‑48‑660041-
local.fund.rffi18‑29‑11051-
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