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dc.contributor.authorMikhalitsyna, E.en
dc.contributor.authorSoboleva, E.en
dc.contributor.authorKataev, V.en
dc.contributor.authorKulesh, N.en
dc.contributor.authorLhderanta, E.en
dc.date.accessioned2020-10-20T16:36:19Z-
dc.date.available2020-10-20T16:36:19Z-
dc.date.issued2019-
dc.identifier.citationMagnetic microstructure of the Finemet-type thin films / E. Mikhalitsyna, E. Soboleva, V. Kataev, N. Kulesh, et al.. — DOI 10.1088/1742-6596/1389/1/012114 // Journal of Physics: Conference Series. — 2019. — Vol. 1. — Iss. 1389. — 12114.en
dc.identifier.issn1742-6588-
dc.identifier.otherhttps://doi.org/10.1088/1742-6596/1389/1/012114pdf
dc.identifier.other1good_DOI
dc.identifier.otherc6ec1f58-ad47-4d4c-a68e-3d0154547261pure_uuid
dc.identifier.otherhttp://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85076724795m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/92568-
dc.description.abstractFe73.9Cu1Nb3Si13.2B8.9 thin films were deposited on the glass substrates by means of ion-plasma radio frequency sputtering. Heat treatment at temperatures of 350, 400 and 450 C was performed for 30 minutes in order to control thin film structural state. The X-ray powder diffraction showed that the crystallization of α-Fe(Si) nanograins took place at the temperature of 420 C whilst the other samples stayed in the amorphous state. The magnetic microstructure of the Fe73.9Cu1Nb3Si13.2B8.9 films was discussed in the framework of random anisotropy model and law of approach of magnetization to saturation. The parameters of magnetic microstructure were determined, and relations between structure and macroscopic magnetic properties were interpreted by means of magnetic microstructure analysis. © Published under licence by IOP Publishing Ltd.en
dc.description.sponsorship№ 18-32-00221en
dc.description.sponsorship№ 02.A03.21.0006en
dc.description.sponsorshipThe study was funded in part by RFBR according to the research project № 18-32-00221 (mol_a). The work was supported by Act 211 Government of the Russian Federation, contract № 02.A03.21.0006.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherInstitute of Physics Publishingen
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceJournal of Physics: Conference Seriesen
dc.subjectAMORPHOUS SILICONen
dc.subjectCOPPER COMPOUNDSen
dc.subjectIRON COMPOUNDSen
dc.subjectMICROSTRUCTUREen
dc.subjectNIOBIUM COMPOUNDSen
dc.subjectSATURATION MAGNETIZATIONen
dc.subjectSILICON COMPOUNDSen
dc.subjectSPUTTERINGen
dc.subjectSUBSTRATESen
dc.subjectTHIN FILMSen
dc.subjectX RAY POWDER DIFFRACTIONen
dc.subjectAMORPHOUS STATEen
dc.subjectCONTROL THIN FILMen
dc.subjectGLASS SUBSTRATESen
dc.subjectLAW OF APPROACHESen
dc.subjectMAGNETIC MICROSTRUCTURESen
dc.subjectRADIO FREQUENCY SPUTTERINGen
dc.subjectRANDOM ANISOTROPY MODELSen
dc.subjectSTRUCTURAL STATEen
dc.subjectBORON COMPOUNDSen
dc.titleMagnetic microstructure of the Finemet-type thin filmsen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.1088/1742-6596/1389/1/012114-
dc.identifier.scopus85076724795-
local.affiliationUral Federal University, Ekaterinburg, 620000, Russian Federation
local.affiliationLUT-University, Department of Physics, Lappeenranta, 53850, Finland
local.contributor.employeeMikhalitsyna, E., Ural Federal University, Ekaterinburg, 620000, Russian Federation
local.contributor.employeeSoboleva, E., LUT-University, Department of Physics, Lappeenranta, 53850, Finland
local.contributor.employeeKataev, V., Ural Federal University, Ekaterinburg, 620000, Russian Federation
local.contributor.employeeKulesh, N., Ural Federal University, Ekaterinburg, 620000, Russian Federation
local.contributor.employeeLhderanta, E., LUT-University, Department of Physics, Lappeenranta, 53850, Finland
local.issue1389-
local.volume1-
dc.identifier.wos000562319800114-
local.identifier.pure11760921-
local.description.order12114-
local.identifier.eid2-s2.0-85076724795-
local.fund.rffi18-32-00221-
local.identifier.wosWOS:000562319800114-
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