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dc.contributor.authorGavrilov, N. V.en
dc.contributor.authorKamenetskikh, A. S.en
dc.contributor.authorTretnikov, P. V.en
dc.contributor.authorChukin, A. V.en
dc.contributor.authorMen'Shakov, A. I.en
dc.date.accessioned2020-10-20T16:35:54Z-
dc.date.available2020-10-20T16:35:54Z-
dc.date.issued2019-
dc.identifier.citationEffect of oxygen flow rate on the deposition rate of α-Al2O3 coatings by anodic evaporation of Al in an arc discharge / N. V. Gavrilov, A. S. Kamenetskikh, P. V. Tretnikov, A. V. Chukin, et al.. — DOI 10.1088/1742-6596/1281/1/012019 // Journal of Physics: Conference Series. — 2019. — Vol. 1. — Iss. 1281. — 12019.en
dc.identifier.issn1742-6588-
dc.identifier.otherhttps://doi.org/10.1088/1742-6596/1281/1/012019pdf
dc.identifier.other1good_DOI
dc.identifier.other5b31bd96-fcb9-4251-90e6-8e4d4d93c1e7pure_uuid
dc.identifier.otherhttp://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85072165610m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/92470-
dc.description.abstractEffect of O2 flow rate on the kinetics of growth and properties of α-Al2O3 coatings deposited by reactive anodic Al evaporation at 640 °C has been studied. It has been shown that the growth rate of coatings changes non-monotonously with O2 flow, rise of the growth rate is due to the increase in the concentration of atomic oxygen in plasma, and the decrease at large O2 flows is associated with transition from the mode of free transit of Al atoms to the diffusion mode. © Published under licence by IOP Publishing Ltd.en
dc.description.sponsorshipRussian Science Foundation, RSF: 18-19-00567en
dc.description.sponsorshipThis work was supported by the Russian Science Foundation under grant No. 18-19-00567.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherInstitute of Physics Publishingen
dc.relationinfo:eu-repo/grantAgreement/RSF//18-19-00567en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceJournal of Physics: Conference Seriesen
dc.subjectALUMINAen
dc.subjectALUMINUM COATINGSen
dc.subjectALUMINUM OXIDEen
dc.subjectDEPOSITION RATESen
dc.subjectDIFFUSION COATINGSen
dc.subjectEVAPORATIONen
dc.subjectGROWTH KINETICSen
dc.subjectOXYGENen
dc.subjectAL2O3 COATINGen
dc.subjectARC DISCHARGEen
dc.subjectATOMIC OXYGENen
dc.subjectDIFFUSION MODESen
dc.subjectEFFECT OF OXYGENen
dc.subjectGROWTH RATEen
dc.titleEffect of oxygen flow rate on the deposition rate of α-Al2O3 coatings by anodic evaporation of Al in an arc dischargeen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.1088/1742-6596/1281/1/012019-
dc.identifier.scopus85072165610-
local.affiliationInstitute of Electrophysics, 106 Amundsena str., Yekaterinburg, 620016, Russian Federation
local.affiliationUral Federal University, 19 Mira str., Yekaterinburg, 620002, Russian Federation
local.contributor.employeeGavrilov, N.V., Institute of Electrophysics, 106 Amundsena str., Yekaterinburg, 620016, Russian Federation
local.contributor.employeeKamenetskikh, A.S., Institute of Electrophysics, 106 Amundsena str., Yekaterinburg, 620016, Russian Federation, Ural Federal University, 19 Mira str., Yekaterinburg, 620002, Russian Federation
local.contributor.employeeTretnikov, P.V., Institute of Electrophysics, 106 Amundsena str., Yekaterinburg, 620016, Russian Federation
local.contributor.employeeChukin, A.V., Ural Federal University, 19 Mira str., Yekaterinburg, 620002, Russian Federation
local.contributor.employeeMen'Shakov, A.I., Institute of Electrophysics, 106 Amundsena str., Yekaterinburg, 620016, Russian Federation
local.issue1281-
local.volume1-
dc.identifier.wos000562039600019-
local.identifier.pure10774816-
local.description.order12019-
local.identifier.eid2-s2.0-85072165610-
local.fund.rsf18-19-00567-
local.identifier.wosWOS:000562039600019-
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