Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/89962
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dc.contributor.authorAbramov, A.en
dc.contributor.authorAlikin, D.en
dc.contributor.authorSobol, A.en
dc.contributor.authorMyakishev, D.en
dc.contributor.authorSlabov, V.en
dc.contributor.authorTrusov, L.en
dc.contributor.authorSafina, V.en
dc.contributor.authorTurygin, A.en
dc.contributor.authorVasiliev, A.en
dc.contributor.authorShur, V.en
dc.contributor.authorKholkin, A.en
dc.contributor.authorШур, В. Я.ru
dc.date.accessioned2020-09-29T09:45:25Z-
dc.date.available2020-09-29T09:45:25Z-
dc.date.issued2020-
dc.identifier.citationChemical solution deposition of BiFeO3 films with layer-by-layer control of the coverage and composition / A. Abramov, D. Alikin, A. Sobol, D. Myakishev, et al. . — DOI 10.3390/COATINGS10050438 // Coatings. — 2020. — Vol. 5. — Iss. 10. — 438.en
dc.identifier.issn2079-6412-
dc.identifier.otherhttps://www.mdpi.com/2079-6412/10/5/438/pdfpdf
dc.identifier.other1good_DOI
dc.identifier.other8343c25f-9c53-4174-bafd-fa8ccd2c6983pure_uuid
dc.identifier.otherhttp://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85085496286m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/89962-
dc.description.abstractChemical solution deposition of BiFeO3 thin films is one of the most commercially available techniques to produce large-scale low-cost coatings for further application in memory devices. In this contribution, we implemented piezoresponse force and conductive atomic force microscopies to study the layer-by-layer sol-gel deposition of BiFeO3 thin films focusing on the local phase distribution, morphology, piezoelectric response, and leakage current. The final properties of resulting thin films are found to be determined not only by the composition of the gel and crystallization step but by the gelation step as well. The drying temperature and treatment duration of the solution are shown to drastically influence the film coverage, which finally determines the morphology of the films and behavior of the crystallization process. © 2020 by the authors.en
dc.description.sponsorshipRussian Science Foundation, RSF: 19-72-10076en
dc.description.sponsorshipThe research was funded by Russian Science Foundation, grant number 19-72-10076. The equipment of the Ural Center for Shared Use “Modern nanotechnology” UrFU was used.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherMDPI AGen
dc.relationinfo:eu-repo/grantAgreement/RSF//19-72-10076en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.rightscc-byother
dc.sourceCoatingsen
dc.subjectBISMUTH FERRITEen
dc.subjectC-AFMen
dc.subjectGELATIONen
dc.subjectPFMen
dc.subjectPIEZORESPONSEen
dc.subjectSOL-GELen
dc.titleChemical solution deposition of BiFeO3 films with layer-by-layer control of the coverage and compositionen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.3390/COATINGS10050438-
dc.identifier.scopus85085496286-
local.affiliationSchool of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationen
local.affiliationMoscow State University, Moscow, 119991, Russian Federationen
local.affiliationDepartment of Physics and CICECO-Aveiro Institute of Materials, University of Aveiro, Aveiro, 3810-193, Portugalen
local.contributor.employeeAbramov, A., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationru
local.contributor.employeeAlikin, D., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationru
local.contributor.employeeSobol, A., Moscow State University, Moscow, 119991, Russian Federationru
local.contributor.employeeMyakishev, D., Moscow State University, Moscow, 119991, Russian Federationru
local.contributor.employeeSlabov, V., Department of Physics and CICECO-Aveiro Institute of Materials, University of Aveiro, Aveiro, 3810-193, Portugalru
local.contributor.employeeTrusov, L., Moscow State University, Moscow, 119991, Russian Federationru
local.contributor.employeeSafina, V., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationru
local.contributor.employeeTurygin, A., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationru
local.contributor.employeeVasiliev, A., Moscow State University, Moscow, 119991, Russian Federationru
local.contributor.employeeShur, V., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federationru
local.contributor.employeeKholkin, A., School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620000, Russian Federation, Department of Physics and CICECO-Aveiro Institute of Materials, University of Aveiro, Aveiro, 3810-193, Portugalru
local.issue10-
local.volume5-
dc.identifier.wos000541770900021-
local.identifier.pure12916541-
local.description.order438-
local.identifier.eid2-s2.0-85085496286-
local.fund.rsf19-72-10076-
local.identifier.wosWOS:000541770900021-
Appears in Collections:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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