Investigation of the conditions for the formation of SiCN-based coatings in arc discharge with self-heated hollow cathode

Abstract

Method for low-temperature (<200°C) deposition of SiCN-based coatings in a large volume chamber (0.3 m 3 ) by decomposition of organosilicon precursor in nitrogen-argon plasma of discharge with self-heated hollow cathode and remote anode (40 cm) at pressure of ∼1 mTorr was investigated. The analysis of the composition of coatings by IR spectroscopy and the analysis of plasma composition are carried out by optical emission spectroscopy. The influence of discharge current (10-40 A) and the flow of gas mixture (5-15 sccm hexamethyldisilazane and 60 sccm Ar-N 2 mixture) on plasma composition and elemental composition of coatings was investigated. It is shown that the degree of decomposition of precursor molecules is increased with growth of the current and with increase of Ar content in the gas mixture. © 2018 Web Portal IOP. All rights reserved.