The threshold of nanopore formation in ion-implanted platinum

Abstract

The method of field-ion microscopy was used to determine the threshold of nanopore formation in ion-implanted platinum. The threshold for ion-implanted platinum corresponds to fluence F = 10 17 ions/cm 2. The size of nanopores is determined: 1-5 nm (transverse) and 1-9 nm (lateral, across the target depth). It is found that up to 40% of nanopores are located in the subsurface layer with a thickness of 10 nm. The obtained results can be used for prediction of radiation stability of materials based on fcc metals. © 2012 Pleiades Publishing, Ltd.