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dc.contributor.authorWong, C. H.en
dc.contributor.authorLortz, R.en
dc.contributor.authorTang, C. Y.en
dc.contributor.authorZatsepin, A. F.en
dc.date.accessioned2022-10-19T05:23:02Z-
dc.date.available2022-10-19T05:23:02Z-
dc.date.issued2022-
dc.identifier.citationTailoring the spatial-dependent Rashba parameter and spin fluctuations in nanomaterials for improved spin-FET functionality / C. H. Wong, R. Lortz, C. Y. Tang et al. // Results in Physics. — 2022. — Vol. 39. — 105703.en
dc.identifier.issn22113797-
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85131816405&doi=10.1016%2fj.rinp.2022.105703&partnerID=40&md5=39199338f89136691c2c1679649faec2link
dc.identifier.urihttp://elar.urfu.ru/handle/10995/118154-
dc.description.abstractThe spatial fluctuation of the Rashba parameter has been a major issue in the development of state-of-the-art spintronic nanodevices. Since stable spin-precession is of vital importance in the spin field-effect transistor (spin-FET), we have developed a Monte Carlo model to justify that the local E-field of heavy dopants is the origin of the fluctuating Rashba parameter. To maintain a stable drain current in spin-FETs, we study how the size of lattice, doping condition, E-field screening, exchange interaction and temperature influence the Rashba interaction in nanomaterials. Our Monte Carlo model can predict the Rashba effect of Graphene/Nickel(1 1 1) substrate at room temperature and presents a path to enhance the Rashba interactions via proximity coupling. More importantly, we have discovered a dip-like structure in the Rashba parameter that strongly scatters the spin states, and we have figured out how to suppress spin fluctuations in the semiconductor channel. Our results are important for the development of the next generation of spin transistors. © 2022en
dc.description.sponsorshipResearch Grants Council, University Grants Committee, 研究資助局: C6025-19G-A, GRF-16302018; Hong Kong Polytechnic University, PolyUen
dc.description.sponsorshipThe study was supported by Research Institute for Advanced Manufacturing and the grants from the Research Grants Council of the Hong Kong Special Administrative Region, China (GRF-16302018 & C6025-19G-A). This work was partially supported by the Research Committee of The Hong Kong Polytechnic University under Project Code G-UAMY.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherElsevier B.V.en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceResults in Physicsen
dc.subjectMONTE CARLO SIMULATIONen
dc.subjectRASHBA EFFECTen
dc.subjectSPINTRONICSen
dc.titleTailoring the spatial-dependent Rashba parameter and spin fluctuations in nanomaterials for improved spin-FET functionalityen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.1016/j.rinp.2022.105703-
dc.identifier.scopus85131816405-
local.contributor.employeeWong, C.H., Institute of Physics and Technology, Ural Federal University, Yekaterinburg, Russian Federation, Department of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, Research Institute for Advanced Manufacturing, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kongen
local.contributor.employeeLortz, R., Department of Physics, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kongen
local.contributor.employeeTang, C.Y., Department of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kongen
local.contributor.employeeZatsepin, A.F., Institute of Physics and Technology, Ural Federal University, Yekaterinburg, Russian Federationen
local.volume39-
dc.identifier.wos000879243600004-
local.contributor.departmentInstitute of Physics and Technology, Ural Federal University, Yekaterinburg, Russian Federationen
local.contributor.departmentDepartment of Physics, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kongen
local.contributor.departmentDepartment of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kongen
local.contributor.departmentResearch Institute for Advanced Manufacturing, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kongen
local.identifier.pure30529309-
local.description.order105703-
local.identifier.eid2-s2.0-85131816405-
local.identifier.wosWOS:000879243600004-
Располагается в коллекциях:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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