Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/117800
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dc.contributor.authorMenshakov, A. I.en
dc.contributor.authorBruhanova, Y. A.en
dc.contributor.authorKukharenko, A. I.en
dc.contributor.authorZhidkov, I. S.en
dc.date.accessioned2022-10-19T05:19:29Z-
dc.date.available2022-10-19T05:19:29Z-
dc.date.issued2022-
dc.identifier.citationSynthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Discharge / A. I. Menshakov, Y. A. Bruhanova, A. I. Kukharenko et al. // Membranes. — 2022. — Vol. 12. — Iss. 3. — 321.en
dc.identifier.issn20770375-
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85126985531&doi=10.3390%2fmembranes12030321&partnerID=40&md5=35b674df02f125f6af0a5658bcc6d468link
dc.identifier.urihttp://elar.urfu.ru/handle/10995/117800-
dc.description.abstractTiSiCN coatings have been obtained by anode evaporation of titanium and the decomposi-tion of hexamethyldisilazane in an arc discharge, using a self-heated hollow cathode, at the pressure rate of 1 mTorr of the Ar+N2 gas mixture. The proposed method makes it possible to independently and widely change the amount of metal and precursor vapor flows, the pressure and composition of the vapor-gas mixture and the degree of ionic interaction on the surface of the growing coating within a single discharge system. The paper presents the method and the results of the effect of a current discharge (10–50 A), and the flux of precursor vapours (0–1 g/h), on deposition rates, compositions, and properties of TiSiCN coatings deposited by an advanced combined PVD+PECVD method. Dense homogeneous TiSiCN coatings up to 6 µm thick and up to 27.5 GPa in hardness were obtained at 7.5 µm/h. The composition of the obtained coatings has been studied by X-ray diffraction and X-ray photoelectron spectroscopy, and it has been shown that the presented methods can form nanocomposite coatings with nanocrystallites TiC, TiN, and TiCxN1−x 3–10 nm in the amorphous matrix based on SiCN. © 2022 by the authors. Licensee MDPI, Basel, Switzerland.en
dc.description.sponsorshipRussian Science Foundation, RSF: 20-79-10059en
dc.description.sponsorshipFunding: This research was funded by Russian Science Fund, grant number 20-79-10059.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherMDPIen
dc.relationinfo:eu-repo/grantAgreement/RSF//20-79-10059en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceMembranesen
dc.subjectANODIC EVAPORATIONen
dc.subjectHOLLOW CATHODE ARCen
dc.subjectNANOCOMPOSITE COATINGSen
dc.subjectPECVDen
dc.subjectPVDen
dc.subjectTISICNen
dc.subjectCATHODESen
dc.subjectCOATINGSen
dc.subjectEVAPORATIONen
dc.subjectGAS MIXTURESen
dc.subjectNANOCOMPOSITESen
dc.subjectPHYSICAL VAPOR DEPOSITIONen
dc.subjectSILICON COMPOUNDSen
dc.subjectTITANIUM CARBIDEen
dc.subjectTITANIUM NITRIDEen
dc.subjectX RAY PHOTOELECTRON SPECTROSCOPYen
dc.subjectANODIC EVAPORATIONen
dc.subjectARC DISCHARGEen
dc.subjectGASES MIXTUREen
dc.subjectHEXAMETHYLDISILAZANEen
dc.subjectHOLLOW CATHODE ARCen
dc.subjectHOLLOW CATHODESen
dc.subjectNANO-COMPOSITE COATINGen
dc.subjectORGANOSILICON COMPOUNDSen
dc.subjectTITANIAen
dc.subjectVAPOR FLOWSen
dc.subjectDEPOSITION RATESen
dc.titleSynthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Dischargeen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.3390/membranes12030321-
dc.identifier.scopus85126985531-
local.contributor.employeeMenshakov, A.I., Institute of Electrophysics of the Ural Branch of the Russian Academy of Sciences, 106 Amundsen Street, Yekaterinburg, 620016, Russian Federation, Institute of Physics and Technology, Ural Federal University, 19 Mira Street, Yekaterinburg, 620002, Russian Federationen
local.contributor.employeeBruhanova, Y.A., Institute of Electrophysics of the Ural Branch of the Russian Academy of Sciences, 106 Amundsen Street, Yekaterinburg, 620016, Russian Federationen
local.contributor.employeeKukharenko, A.I., Institute of Physics and Technology, Ural Federal University, 19 Mira Street, Yekaterinburg, 620002, Russian Federationen
local.contributor.employeeZhidkov, I.S., Institute of Physics and Technology, Ural Federal University, 19 Mira Street, Yekaterinburg, 620002, Russian Federation, M.N. Mikheev Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences, 18 Sofia Kovalevskoi Street, Yekaterinburg, 620990, Russian Federationen
local.issue3-
local.volume12-
dc.identifier.wos000774150100001-
local.contributor.departmentInstitute of Electrophysics of the Ural Branch of the Russian Academy of Sciences, 106 Amundsen Street, Yekaterinburg, 620016, Russian Federationen
local.contributor.departmentInstitute of Physics and Technology, Ural Federal University, 19 Mira Street, Yekaterinburg, 620002, Russian Federationen
local.contributor.departmentM.N. Mikheev Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences, 18 Sofia Kovalevskoi Street, Yekaterinburg, 620990, Russian Federationen
local.identifier.pure29928821-
local.description.order321-
local.identifier.eid2-s2.0-85126985531-
local.fund.rsf20-79-10059-
local.identifier.wosWOS:000774150100001-
Appears in Collections:Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC

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