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|Title:||Ultra-Fast Relaxation of Electrons in Wide-Gap Dielectrics|
|Authors:||Fitting, H. -J.|
Kortov, V. S.
|Citation:||Fitting H. -J. Ultra-Fast Relaxation of Electrons in Wide-Gap Dielectrics / H. -J. Fitting, V. S. Kortov, G. Petite. — DOI 10.3390/toxics10020069 // Journal of Luminescence. — 2007. — Vol. 122-123. — Iss. 1-2. — P. 542-545.|
|Abstract:||Low-energy electrons scattered in the conduction band of a dielectric solid should behave like Bloch electrons and will interact with perturbations of the atomic lattice, i.e. with phonons. Thus the phonon-based description of low-energy scattering within an energy band structure of a solid bears certain advantages against common free-electron scattering mechanisms. Moreover, the inelastic scattering is described by the dielectric energy loss function. With these collective scattering models we have performed the simulation of excited electron relaxation and attenuation in the insulator SiO2. After excitation to a mean initial energy of several eV their energy relaxation occurs within a short time interval of 200 fs to full thermalization. There is a very rapid impact ionization cooling connected with cascading of electrons at the beginning during the first 10 fs, followed by much slower attenuation due to phonon losses in wide-gap dielectrics and insulators. © 2006 Elsevier B.V. All rights reserved.|
ELECTRON IMPACT IONIZATION
|metadata.dc.description.sponsorship:||We are grateful to the support by the INTAS project 01-0458 “Fast electronic processes in dielectrics”.|
|Appears in Collections:||Научные публикации, проиндексированные в SCOPUS и WoS CC|
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