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dc.contributor.authorSilva, J. P. B.en
dc.contributor.authorNegrea, R. F.en
dc.contributor.authorIstrate, M. C.en
dc.contributor.authorDutta, S.en
dc.contributor.authorAramberri, H.en
dc.contributor.authorÍñiguez, J.en
dc.contributor.authorFigueiras, F. G.en
dc.contributor.authorGhica, C.en
dc.contributor.authorSekhar, K. C.en
dc.contributor.authorKholkin, A. L.en
dc.date.accessioned2022-05-12T08:12:33Z-
dc.date.available2022-05-12T08:12:33Z-
dc.date.issued2021-
dc.identifier.citationWake-up Free Ferroelectric Rhombohedral Phase in Epitaxially Strained ZrO2 Thin Films / J. P. B. Silva, R. F. Negrea, M. C. Istrate et al. — DOI 10.1103/PhysRevB.104.064418 // ACS Applied Materials and Interfaces. — 2021. — Vol. 13. — Iss. 43. — P. 51383-51392.en
dc.identifier.issn1944-8244-
dc.identifier.otherAll Open Access, Green3
dc.identifier.urihttp://elar.urfu.ru/handle/10995/111082-
dc.description.abstractZirconia- and hafnia-based thin films have attracted tremendous attention in the past decade because of their unexpected ferroelectric behavior at the nanoscale, which enables the downscaling of ferroelectric devices. The present work reports an unprecedented ferroelectric rhombohedral phase of ZrO2 that can be achieved in thin films grown directly on (111)-Nb:SrTiO3 substrates by ion-beam sputtering. Structural and ferroelectric characterizations reveal (111)-oriented ZrO2 films under epitaxial compressive strain exhibiting switchable ferroelectric polarization of about 20.2 μC/cm2 with a coercive field of 1.5 MV/cm. Moreover, the time-dependent polarization reversal characteristics of Nb:SrTiO3/ZrO2/Au film capacitors exhibit typical bell-shaped curve features associated with the ferroelectric domain reversal and agree well with the nucleation limited switching (NLS) model. The polarization-electric field hysteresis loops point to an activation field comparable to the coercive field. Interestingly, the studied films show ferroelectric behavior per se, without the need to apply the wake-up cycle found in the orthorhombic phase of ZrO2. Overall, the rhombohedral ferroelectric ZrO2 films present technological advantages over the previously studied zirconia- and hafnia-based thin films and may be attractive for nanoscale ferroelectric devices. © 2021 American Chemical Society.en
dc.description.sponsorshipThis work was supported by (i) the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Funding Contract UIDB/04650/2020 (ii) DST-SERB, Government of India, through Grant ECR/2017/00006, (iii) Project NECL - NORTE-01-0145-FEDER-022096 and Project UID/NAN/50024/2019. This work was also developed within the scope of the project CICECO-Aveiro Institute of Materials, refs UIDB/50011/2020 and UIDP/50011/2020, financed by national funds through the Portuguese Foundation for Science and Technology/MCTES. R.F.N., M.C.I,. and C.G. acknowledge the financial support from the Romanian Ministry of Education and Research within the project PN-III-P4-ID-PCCF2016-0047, contract 16/2018. Work at LIST was supported by the Luxembourg National Research Fund through projects PRIDE/15/10935404 “MASSENA” (S.D.) and INTER/ANR/16/11562984 “EXPAND” (H.A. and J.Í.). The authors acknowledge the CERIC–ERIC Consortium for access to experimental facilities and financial support under proposal 20192055. The authors also thank José Santos for technical support in the Thin Film Laboratory at CF-UM-UP. The equipment of the Ural Center for Shared Use “modern nanotechnology” Ural Federal University (Reg. No. 2968) was used with the financial support of the Ministry of Science and Higher Education of the RF (Project No. 075-15-2021-677).en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherAmerican Chemical Societyen1
dc.publisherAmerican Chemical Society (ACS)en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceACS Appl. Mater. Interfaces2
dc.sourceACS Applied Materials and Interfacesen
dc.subjectEPITAXIALLY STRAINED FILMSen
dc.subjectFERROELECTRICITYen
dc.subjectION-BEAM SPUTTERING DEPOSITION TECHNIQUEen
dc.subjectRHOMBOHEDRAL ZRO2FILMSen
dc.subjectWAKE-UP FREE FILMSen
dc.subjectCOERCIVE FORCEen
dc.subjectELECTRIC FIELDSen
dc.subjectFERROELECTRIC FILMSen
dc.subjectHAFNIUM OXIDESen
dc.subjectION BEAMSen
dc.subjectNANOTECHNOLOGYen
dc.subjectPOLARIZATIONen
dc.subjectSPUTTERINGen
dc.subjectSTRONTIUM TITANATESen
dc.subjectTHIN FILMSen
dc.subjectZIRCONIAen
dc.subjectDEPOSITION TECHNIQUEen
dc.subjectEPITAXIALLY STRAINED FILMen
dc.subjectFREE FILMSen
dc.subjectION BEAM SPUTTERING DEPOSITIONen
dc.subjectSTRAINED FILMSen
dc.subjectWAKE UPen
dc.subjectZRO 2 FILMSen
dc.titleWake-up Free Ferroelectric Rhombohedral Phase in Epitaxially Strained ZrO2 Thin Filmsen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/submittedVersionen
dc.identifier.rsi47525396-
dc.identifier.doi10.1021/acsami.1c15875-
dc.identifier.scopus85118840154-
local.contributor.employeeSilva, J.P.B., Centre of Physics of Minho and Porto Universities (CF-UM-UP), Campus de Gualtar, Braga, 4710-057, Portugal; Negrea, R.F., National Institute of Materials Physics, 105 bisAtomistilor, Magurele, 077125, Romania, BCAST, Brunel University London, Middlesex, Uxbridge, UB8 3PH, United Kingdom; Istrate, M.C., National Institute of Materials Physics, 105 bisAtomistilor, Magurele, 077125, Romania; Dutta, S., Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), 5 avenue des Hauts-Fourneaux, Esch/Alzette, L-4362, Luxembourg, Department of Physics and Materials Science, University of Luxembourg, Rue du Brill 41, Belvaux, L-4422, Luxembourg; Aramberri, H., Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), 5 avenue des Hauts-Fourneaux, Esch/Alzette, L-4362, Luxembourg; Íñiguez, J., Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), 5 avenue des Hauts-Fourneaux, Esch/Alzette, L-4362, Luxembourg, Department of Physics and Materials Science, University of Luxembourg, Rue du Brill 41, Belvaux, L-4422, Luxembourg; Figueiras, F.G., IFIMUP, Department of Physics and Astronomy, Sciences Faculty, University of Porto, Rua do Campo Alegre, 687, Porto, 4169-007, Portugal; Ghica, C., National Institute of Materials Physics, 105 bisAtomistilor, Magurele, 077125, Romania; Sekhar, K.C., Department of Physics, School of Basic and Applied Science, Central University of Tamil Nadu, Thiruvarur, 610 101, India; Kholkin, A.L., Department of Physics, CICECO-Aveiro Institute of Materials, University of Aveiro, Aveiro, 3810-193, Portugal, School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620002, Russian Federationen
local.description.firstpage51383-
local.description.lastpage51392-
local.issue43-
local.volume13-
dc.identifier.wos000715852100071-
local.contributor.departmentCentre of Physics of Minho and Porto Universities (CF-UM-UP), Campus de Gualtar, Braga, 4710-057, Portugal; National Institute of Materials Physics, 105 bisAtomistilor, Magurele, 077125, Romania; BCAST, Brunel University London, Middlesex, Uxbridge, UB8 3PH, United Kingdom; Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), 5 avenue des Hauts-Fourneaux, Esch/Alzette, L-4362, Luxembourg; Department of Physics and Materials Science, University of Luxembourg, Rue du Brill 41, Belvaux, L-4422, Luxembourg; IFIMUP, Department of Physics and Astronomy, Sciences Faculty, University of Porto, Rua do Campo Alegre, 687, Porto, 4169-007, Portugal; Department of Physics, School of Basic and Applied Science, Central University of Tamil Nadu, Thiruvarur, 610 101, India; Department of Physics, CICECO-Aveiro Institute of Materials, University of Aveiro, Aveiro, 3810-193, Portugal; School of Natural Sciences and Mathematics, Ural Federal University, Ekaterinburg, 620002, Russian Federationen
local.identifier.pure28942175-
local.identifier.eid2-s2.0-85118840154-
local.identifier.wosWOS:000715852100071-
local.identifier.pmid34694130-
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