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Title: | Sn-loss effect in a Sn-implanted a-SiO 2 host-matrix after thermal annealing: A combined XPS, PL, and DFT study |
Authors: | Zatsepin, D. A. Zatsepin, A. F. Boukhvalov, D. W. Kurmaev, E. Z. Gavrilov, N. V. |
Issue Date: | 2016 |
Publisher: | Elsevier B.V. |
Citation: | Sn-loss effect in a Sn-implanted a-SiO 2 host-matrix after thermal annealing: A combined XPS, PL, and DFT study / D. A. Zatsepin, A. F. Zatsepin, D. W. Boukhvalov, et al. — DOI 10.1016/j.apsusc.2016.01.126 // Applied Surface Science. — 2016. — Vol. 367. — P. 320-326. |
Abstract: | Amorphous a-SiO 2 host-matrices were implanted with Sn-ions with and without posterior thermal tempering at 900 °C for 1 h in ambient air. X-ray photoelectron spectroscopy analysis (XPS core-levels, XPS valence band mapping), photoluminescence (PL) probing, and density functional calculations (DFT) were employed to enable a detailed electronic structure characterization of these samples. It was experimentally established that the process of Sn-embedding into the a-SiO 2 host occurs following two dissimilar trends: the Sn 4+ → Si 4+ substitution in a-SiO 2 :Sn (without tempering), and Sn-metal clustering as interstitials in a-SiO 2 :Sn (900 °C, 1 h). Both trends were modeled using calculated formation energies and partial densities of states (PDOS) as well as valence band (VB) simulations, which yielded evidence that substitutional defect generation occurs with the help of ion-implantation stimulated translocation of the host-atoms from their stoichiometric positions to the interstitial void. Experimental and theoretical data obtained coincide in terms of the reported Sn-loss effect in a-SiO 2 :Sn (900 °C, 1 h) due to thermally-induced electronic host-structure re-arraignment, which manifests as backward host-atoms translocation into stoichiometric positions and the posterior formation of Sn-metal clusters. © 2016 Elsevier B.V. All rights reserved. |
Keywords: | DFT MODELING ION IMPLANTATION PHOTOLUMINESCENCE QUARTZ SOFT X-RAY CRYSTAL ATOMIC STRUCTURE ELECTRONIC STRUCTURE ION IMPLANTATION IONS PHOTOLUMINESCENCE QUARTZ SILICA TEMPERING VALENCE BANDS X RAYS DFT MODELING FORMATION ENERGIES INTERSTITIAL VOIDS SOFT X-RAY STRUCTURE CHARACTERIZATION SUBSTITUTIONAL DEFECTS THERMAL TEMPERING THERMAL-ANNEALING X RAY PHOTOELECTRON SPECTROSCOPY |
URI: | http://elar.urfu.ru/handle/10995/102281 |
Access: | info:eu-repo/semantics/openAccess |
SCOPUS ID: | 84959422849 |
WOS ID: | 000372519300040 |
PURE ID: | d8ed7594-c4ef-4452-a680-43815bd258e0 700345 |
ISSN: | 1694332 |
DOI: | 10.1016/j.apsusc.2016.01.126 |
Appears in Collections: | Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC |
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