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dc.contributor.authorDorosheva, I. B.en
dc.contributor.authorVokhmintsev, A. S.en
dc.contributor.authorKamalov, R. V.en
dc.contributor.authorGryaznov, A. O.en
dc.contributor.authorWeinstein, I. A.en
dc.date.accessioned2021-08-31T15:00:56Z-
dc.date.available2021-08-31T15:00:56Z-
dc.date.issued2018-
dc.identifier.citationOxide layer thickness effects on the resistance switching characteristics of Ti/TiO2-NT/Au structure / I. B. Dorosheva, A. S. Vokhmintsev, R. V. Kamalov, et al. — DOI 10.1109/USBEREIT.2018.8384604 // Proceedings - 2018 Ural Symposium on Biomedical Engineering, Radioelectronics and Information Technology, USBEREIT 2018. — 2018. — P. 279-282.en
dc.identifier.isbn9781538649466-
dc.identifier.otherFinal2
dc.identifier.otherAll Open Access, Green3
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85049888588&doi=10.1109%2fUSBEREIT.2018.8384604&partnerID=40&md5=c039b9e4d965cfc0292818160fe1cf9e
dc.identifier.otherhttp://arxiv.org/pdf/1906.06555m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/101963-
dc.description.abstractSelf-ordered nanotubular titania TiO2-NT with outer tube diameter of 45 nm are synthesized using the anodic oxidation of titanium foil. Four sets of memristors with 100 μm diameter based on Ti/TiO2-NT/Au sandwich structures with an oxide layer thickness of 80, 120, 160 and 200 nm are fabricated. Current-voltage (CV) characteristics for the obtained samples in the static and dynamic operation modes are studied. Resistance in high and low resistance states is estimated. Basing on the analysis of the CV characteristics in dynamic mode (> 14 000 switchings) a prospective of use for synthesized Ti/TiO2-NT/Au micromemristors with oxide layer thickness of 160 nm in non-volatile memory is shown. © 2018 IEEE.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceProc. - Ural Symp. Biomed. Eng., Radioelectron. Inf. Technol., USBEREIT2
dc.sourceProceedings - 2018 Ural Symposium on Biomedical Engineering, Radioelectronics and Information Technology, USBEREIT 2018en
dc.subjectANODIC TITANIAen
dc.subjectMEMRISTORen
dc.subjectNANOTUBULAR STRUCTUREen
dc.subjectRESISTIVE SWITCHINGen
dc.subjectTITANIUM DIOXIDE NANOTUBESen
dc.subjectANODIC OXIDATIONen
dc.subjectBIOMEDICAL ENGINEERINGen
dc.subjectDIGITAL STORAGEen
dc.subjectMEMRISTORSen
dc.subjectTITANIUM DIOXIDEen
dc.subjectYARNen
dc.subjectANODIC TITANIAen
dc.subjectMEMRISTORen
dc.subjectNANO-TUBULAR STRUCTUREen
dc.subjectRESISTIVE SWITCHINGen
dc.subjectTITANIUM DIOXIDE NANOTUBESen
dc.subjectTITANIUM OXIDESen
dc.titleOxide layer thickness effects on the resistance switching characteristics of Ti/TiO2-NT/Au structureen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.rsi35760796-
dc.identifier.doi10.1109/USBEREIT.2018.8384604-
dc.identifier.scopus85049888588-
local.contributor.employeeDorosheva, I.B., NANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.contributor.employeeVokhmintsev, A.S., NANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.contributor.employeeKamalov, R.V., NANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.contributor.employeeGryaznov, A.O., NANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.contributor.employeeWeinstein, I.A., NANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.description.firstpage279-
local.description.lastpage282-
local.contributor.departmentNANOTECH Center, Ural Federal University, Yekaterinburg, Russian Federation
local.identifier.pure7655477-
local.identifier.pure85751e11-3bda-4b15-959e-b9441358e54duuid
local.identifier.eid2-s2.0-85049888588-
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