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DC Field | Value | Language |
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dc.contributor.author | Boukhvalov, D. W. | en |
dc.contributor.author | Kurmaev, E. Z. | en |
dc.contributor.author | Urbańczyk, E. | en |
dc.contributor.author | Dercz, G. | en |
dc.contributor.author | Stolarczyk, A. | en |
dc.contributor.author | Simka, W. | en |
dc.contributor.author | Kukharenko, A. I. | en |
dc.contributor.author | Zhidkov, I. S. | en |
dc.contributor.author | Slesarev, A. I. | en |
dc.contributor.author | Zatsepin, A. F. | en |
dc.contributor.author | Cholakh, S. O. | en |
dc.date.accessioned | 2021-08-31T15:00:45Z | - |
dc.date.available | 2021-08-31T15:00:45Z | - |
dc.date.issued | 2018 | - |
dc.identifier.citation | Atomic and electronic structure of graphene oxide/Cu interface / D. W. Boukhvalov, E. Z. Kurmaev, E. Urbańczyk, et al. — DOI 10.1016/j.tsf.2018.09.002 // Thin Solid Films. — 2018. — Vol. 665. — P. 99-108. | en |
dc.identifier.issn | 406090 | - |
dc.identifier.other | Final | 2 |
dc.identifier.other | All Open Access, Green | 3 |
dc.identifier.other | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85053207088&doi=10.1016%2fj.tsf.2018.09.002&partnerID=40&md5=f2f91eeb56c35187bbb7d1c2fa1232a3 | |
dc.identifier.other | http://arxiv.org/pdf/1809.00450 | m |
dc.identifier.uri | http://elar.urfu.ru/handle/10995/101938 | - |
dc.description.abstract | The results of X-ray photoemission (XPS) and valence bands spectroscopy, optically stimulated electron emission (OSEE) measurements and density functional theory based modeling of graphene oxide (GO) placed on Cu via an electrophoretic deposition (EPD) are reported. The comparison of XPS spectra of EPD prepared GO/Cu composites with those of as prepared GO, strongly reduced GO, pure and oxidized copper demonstrate the partial (until C/O ratio about two) removal of oxygen-containing functional groups from GO simultaneously with the formation of copper oxide-like layers over the metallic substrate. OSEE measurements evidence the presence of copper oxide phase in the systems simultaneously with the absence of contributions from GO with corresponding energy gap. All measurements demonstrate the similarity of the results for different thickness of GO cover of the copper surface. Theoretical modeling demonstrates favorability of migration of oxygen-containing functional groups from GO to the copper substrate only for the case of C/O ratio below two and formation of Cu-O-C bonds between substrate and GO simultaneously with the vanishing of the energy gap in GO layer. Basing on results of experimental measurements and theoretical calculations we suggest the model of atomic structure for Cu/GO interface as Cu/CuO/GO with C/O ratio in gapless GO about two. © 2018 Elsevier B.V. | en |
dc.format.mimetype | application/pdf | en |
dc.language.iso | en | en |
dc.publisher | Elsevier B.V. | en |
dc.rights | info:eu-repo/semantics/openAccess | en |
dc.source | Thin Solid Films | 2 |
dc.source | Thin Solid Films | en |
dc.subject | CONDUCTIVITY | en |
dc.subject | DENSITY FUNCTIONAL THEORY | en |
dc.subject | GRAPHENE | en |
dc.subject | GRAPHENE OXIDE | en |
dc.subject | REDUCED GRAPHENE OXIDE | en |
dc.subject | X-RAY PHOTOELECTRON SPECTROSCOPY | en |
dc.subject | COPPER OXIDES | en |
dc.subject | DENSITY FUNCTIONAL THEORY | en |
dc.subject | DEPOSITION | en |
dc.subject | ELECTRIC CONDUCTIVITY | en |
dc.subject | ELECTRON EMISSION | en |
dc.subject | ELECTRONIC STRUCTURE | en |
dc.subject | ELECTROPHORESIS | en |
dc.subject | ENERGY GAP | en |
dc.subject | GRAPHENE OXIDE | en |
dc.subject | OXYGEN | en |
dc.subject | SUBSTRATES | en |
dc.subject | X RAY PHOTOELECTRON SPECTROSCOPY | en |
dc.subject | DIFFERENT THICKNESS | en |
dc.subject | ELECTROPHORETIC DEPOSITIONS | en |
dc.subject | FORMATION-OF-COPPER OXIDES | en |
dc.subject | OXYGEN-CONTAINING FUNCTIONAL GROUPS | en |
dc.subject | REDUCED GRAPHENE OXIDES | en |
dc.subject | THEORETICAL CALCULATIONS | en |
dc.subject | THEORETICAL MODELING | en |
dc.subject | X-RAY PHOTOEMISSIONS | en |
dc.subject | GRAPHENE | en |
dc.title | Atomic and electronic structure of graphene oxide/Cu interface | en |
dc.type | Article | en |
dc.type | info:eu-repo/semantics/article | en |
dc.type | info:eu-repo/semantics/publishedVersion | en |
dc.identifier.rsi | 35730771 | - |
dc.identifier.doi | 10.1016/j.tsf.2018.09.002 | - |
dc.identifier.scopus | 85053207088 | - |
local.contributor.employee | Boukhvalov, D.W., Department of Chemistry, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 04763, South Korea, Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Kurmaev, E.Z., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation, M.N. Mikheev Institute of Metal Physics of Ural Branch of Russian Academy of Sciences, 18 Kovalevskoj Str., Yekaterinburg, 620990, Russian Federation | |
local.contributor.employee | Urbańczyk, E., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland | |
local.contributor.employee | Dercz, G., Institute of Materials Science, University of Silesia, 75 Pułku Piechoty Street 1 A, Chorzów, 41-500, Poland | |
local.contributor.employee | Stolarczyk, A., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland | |
local.contributor.employee | Simka, W., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland | |
local.contributor.employee | Kukharenko, A.I., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Zhidkov, I.S., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Slesarev, A.I., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Zatsepin, A.F., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.employee | Cholakh, S.O., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.description.firstpage | 99 | - |
local.description.lastpage | 108 | - |
local.volume | 665 | - |
dc.identifier.wos | 000447427400015 | - |
local.contributor.department | Department of Chemistry, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 04763, South Korea | |
local.contributor.department | Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation | |
local.contributor.department | M.N. Mikheev Institute of Metal Physics of Ural Branch of Russian Academy of Sciences, 18 Kovalevskoj Str., Yekaterinburg, 620990, Russian Federation | |
local.contributor.department | Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland | |
local.contributor.department | Institute of Materials Science, University of Silesia, 75 Pułku Piechoty Street 1 A, Chorzów, 41-500, Poland | |
local.identifier.pure | 6e99c1ac-d4e7-4ff7-add4-d8de667f3b5a | uuid |
local.identifier.pure | 7890330 | - |
local.identifier.eid | 2-s2.0-85053207088 | - |
local.identifier.wos | WOS:000447427400015 | - |
Appears in Collections: | Научные публикации ученых УрФУ, проиндексированные в SCOPUS и WoS CC |
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2-s2.0-85053207088.pdf | 1,16 MB | Adobe PDF | View/Open |
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