Please use this identifier to cite or link to this item: http://elar.urfu.ru/handle/10995/101938
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dc.contributor.authorBoukhvalov, D. W.en
dc.contributor.authorKurmaev, E. Z.en
dc.contributor.authorUrbańczyk, E.en
dc.contributor.authorDercz, G.en
dc.contributor.authorStolarczyk, A.en
dc.contributor.authorSimka, W.en
dc.contributor.authorKukharenko, A. I.en
dc.contributor.authorZhidkov, I. S.en
dc.contributor.authorSlesarev, A. I.en
dc.contributor.authorZatsepin, A. F.en
dc.contributor.authorCholakh, S. O.en
dc.date.accessioned2021-08-31T15:00:45Z-
dc.date.available2021-08-31T15:00:45Z-
dc.date.issued2018-
dc.identifier.citationAtomic and electronic structure of graphene oxide/Cu interface / D. W. Boukhvalov, E. Z. Kurmaev, E. Urbańczyk, et al. — DOI 10.1016/j.tsf.2018.09.002 // Thin Solid Films. — 2018. — Vol. 665. — P. 99-108.en
dc.identifier.issn406090-
dc.identifier.otherFinal2
dc.identifier.otherAll Open Access, Green3
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85053207088&doi=10.1016%2fj.tsf.2018.09.002&partnerID=40&md5=f2f91eeb56c35187bbb7d1c2fa1232a3
dc.identifier.otherhttp://arxiv.org/pdf/1809.00450m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/101938-
dc.description.abstractThe results of X-ray photoemission (XPS) and valence bands spectroscopy, optically stimulated electron emission (OSEE) measurements and density functional theory based modeling of graphene oxide (GO) placed on Cu via an electrophoretic deposition (EPD) are reported. The comparison of XPS spectra of EPD prepared GO/Cu composites with those of as prepared GO, strongly reduced GO, pure and oxidized copper demonstrate the partial (until C/O ratio about two) removal of oxygen-containing functional groups from GO simultaneously with the formation of copper oxide-like layers over the metallic substrate. OSEE measurements evidence the presence of copper oxide phase in the systems simultaneously with the absence of contributions from GO with corresponding energy gap. All measurements demonstrate the similarity of the results for different thickness of GO cover of the copper surface. Theoretical modeling demonstrates favorability of migration of oxygen-containing functional groups from GO to the copper substrate only for the case of C/O ratio below two and formation of Cu-O-C bonds between substrate and GO simultaneously with the vanishing of the energy gap in GO layer. Basing on results of experimental measurements and theoretical calculations we suggest the model of atomic structure for Cu/GO interface as Cu/CuO/GO with C/O ratio in gapless GO about two. © 2018 Elsevier B.V.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherElsevier B.V.en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceThin Solid Films2
dc.sourceThin Solid Filmsen
dc.subjectCONDUCTIVITYen
dc.subjectDENSITY FUNCTIONAL THEORYen
dc.subjectGRAPHENEen
dc.subjectGRAPHENE OXIDEen
dc.subjectREDUCED GRAPHENE OXIDEen
dc.subjectX-RAY PHOTOELECTRON SPECTROSCOPYen
dc.subjectCOPPER OXIDESen
dc.subjectDENSITY FUNCTIONAL THEORYen
dc.subjectDEPOSITIONen
dc.subjectELECTRIC CONDUCTIVITYen
dc.subjectELECTRON EMISSIONen
dc.subjectELECTRONIC STRUCTUREen
dc.subjectELECTROPHORESISen
dc.subjectENERGY GAPen
dc.subjectGRAPHENE OXIDEen
dc.subjectOXYGENen
dc.subjectSUBSTRATESen
dc.subjectX RAY PHOTOELECTRON SPECTROSCOPYen
dc.subjectDIFFERENT THICKNESSen
dc.subjectELECTROPHORETIC DEPOSITIONSen
dc.subjectFORMATION-OF-COPPER OXIDESen
dc.subjectOXYGEN-CONTAINING FUNCTIONAL GROUPSen
dc.subjectREDUCED GRAPHENE OXIDESen
dc.subjectTHEORETICAL CALCULATIONSen
dc.subjectTHEORETICAL MODELINGen
dc.subjectX-RAY PHOTOEMISSIONSen
dc.subjectGRAPHENEen
dc.titleAtomic and electronic structure of graphene oxide/Cu interfaceen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.rsi35730771-
dc.identifier.doi10.1016/j.tsf.2018.09.002-
dc.identifier.scopus85053207088-
local.contributor.employeeBoukhvalov, D.W., Department of Chemistry, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 04763, South Korea, Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.employeeKurmaev, E.Z., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation, M.N. Mikheev Institute of Metal Physics of Ural Branch of Russian Academy of Sciences, 18 Kovalevskoj Str., Yekaterinburg, 620990, Russian Federation
local.contributor.employeeUrbańczyk, E., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland
local.contributor.employeeDercz, G., Institute of Materials Science, University of Silesia, 75 Pułku Piechoty Street 1 A, Chorzów, 41-500, Poland
local.contributor.employeeStolarczyk, A., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland
local.contributor.employeeSimka, W., Faculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland
local.contributor.employeeKukharenko, A.I., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.employeeZhidkov, I.S., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.employeeSlesarev, A.I., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.employeeZatsepin, A.F., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.employeeCholakh, S.O., Institute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.description.firstpage99-
local.description.lastpage108-
local.volume665-
dc.identifier.wos000447427400015-
local.contributor.departmentDepartment of Chemistry, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 04763, South Korea
local.contributor.departmentInstitute of Physics and Technology, Ural Federal University, Mira Str. 19, Yekaterinburg, 620002, Russian Federation
local.contributor.departmentM.N. Mikheev Institute of Metal Physics of Ural Branch of Russian Academy of Sciences, 18 Kovalevskoj Str., Yekaterinburg, 620990, Russian Federation
local.contributor.departmentFaculty of Chemistry, Silesian University of Technology, B. Krzywoustego Street 6, Gliwice, 44-100, Poland
local.contributor.departmentInstitute of Materials Science, University of Silesia, 75 Pułku Piechoty Street 1 A, Chorzów, 41-500, Poland
local.identifier.pure6e99c1ac-d4e7-4ff7-add4-d8de667f3b5auuid
local.identifier.pure7890330-
local.identifier.eid2-s2.0-85053207088-
local.identifier.wosWOS:000447427400015-
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