Применение низкоэнергетичного электронного пучка для осаждения покрытий на основе карбонитрида кремния

Abstract

The method of low-temperature (200-500°C) deposition of SiCN-coatings by decomposition of hexamethyldisilazane (HMDS) in a wide (700 cm2) low-energy (200 eV) electron beam plasma has been investigated. Optimal grid parameters were determined to ensure uniformity of plasma cathode emission in the longitudinal and radial directions. The analysis of the composition of coatings by the method of IR-spectroscopy, and analysis of the composition of the plasma by optical emission spectroscopy. SiCN-based coatings with a thickness of 4–5 μm and hardness up to 8–10 GPa were obtained.