Please use this identifier to cite or link to this item: https://elar.urfu.ru/handle/10995/111460
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dc.contributor.authorMorozovska, A. N.en
dc.contributor.authorEliseev, E. A.en
dc.contributor.authorSvechnikov, S. V.en
dc.contributor.authorKrutov, A. D.en
dc.contributor.authorShur, V. Y.en
dc.contributor.authorBorisevich, A. Y.en
dc.contributor.authorMaksymovych, P.en
dc.contributor.authorKalinin, S. V.en
dc.contributor.authorШур, В. Я.ru
dc.date.accessioned2022-05-12T08:18:08Z-
dc.date.available2022-05-12T08:18:08Z-
dc.date.issued2010-
dc.identifier.citationFinite Size and Intrinsic Field Effect on the Polar-Active Properties of Ferroelectric-Semiconductor Heterostructures / A. N. Morozovska, E. A. Eliseev, S. V. Svechnikov et al. // Physical Review B - Condensed Matter and Materials Physics. — 2010. — Vol. 81. — Iss. 20. — 205308.en
dc.identifier.issn1098-0121-
dc.identifier.otherAll Open Access, Green3
dc.identifier.urihttp://elar.urfu.ru/handle/10995/111460-
dc.description.abstractUsing Landau-Ginzburg-Devonshire approach we calculated the equilibrium distributions of electric field, polarization, and space charge in the ferroelectric-semiconductor heterostructures containing proper or incipient ferroelectric thin films. The role of the polarization gradient and intrinsic surface energy, interface dipoles, and free charges on polarization dynamics are specifically explored. The intrinsic field effects, which originated at the ferroelectric-semiconductor interface, lead to the surface band bending and result into the formation of depletion space-charge layer near the semiconductor surface. During the local polarization reversal (caused by the electric field of the nanosized tip of the scanning probe microscope) the thickness and charge of the interface layer drastically changes, in particular, the sign of the screening carriers is determined by the polarization direction. Obtained analytical solutions could be extended to analyze polarization-mediated electronic transport. © 2010 The American Physical Society.en
dc.description.sponsorshipAuthors are grateful to E. Tsymbal and E. Tsymbal for valuable critical remarks. Research is sponsored by Ministry of Science and Education of Ukraine and National Science Foundation(Materials World Network, Grant No. DMR-0908718). S.V.K. and A.B. acknowledge the DOE SISGR program. P.M. is supported by the Division of Scientific User Facilities, US DOE.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherAmerican Physical Society (APS)en
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourcePhys. Rev. B Condens. Matter Mater. Phys.2
dc.sourcePhysical Review B - Condensed Matter and Materials Physicsen
dc.titleFinite Size and Intrinsic Field Effect on the Polar-Active Properties of Ferroelectric-Semiconductor Heterostructuresen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/submittedVersionen
dc.identifier.scopus77955749891-
local.contributor.employeeMorozovska, A.N., Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 03028 Kiev, Ukraine; Eliseev, E.A., Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 03028 Kiev, Ukraine, Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, 03142 Kiev, Ukraine; Svechnikov, S.V., Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 03028 Kiev, Ukraine; Krutov, A.D., Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 03028 Kiev, Ukraine, Taras Shevchenko National University of Kyiv, 01033 Kiev, Ukraine; Shur, V.Y., Institute of Physics and Applied Mathematics, Ural State University, 620083 Ekaterinburg, Russian Federation; Borisevich, A.Y., Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States; Maksymovych, P., Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States; Kalinin, S.V., Oak Ridge National Laboratory, Oak Ridge, TN 37831, United Statesen
local.issue20-
local.volume81-
dc.identifier.wos000278144500060-
local.contributor.departmentInstitute of Semiconductor Physics, National Academy of Sciences of Ukraine, 03028 Kiev, Ukraine; Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, 03142 Kiev, Ukraine; Taras Shevchenko National University of Kyiv, 01033 Kiev, Ukraine; Institute of Physics and Applied Mathematics, Ural State University, 620083 Ekaterinburg, Russian Federation; Oak Ridge National Laboratory, Oak Ridge, TN 37831, United Statesen
local.identifier.pure7246028-
local.description.order205308-
local.identifier.eid2-s2.0-77955749891-
local.fund.nsfDMR-0908718-
local.identifier.wosWOS:000278144500060-
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