Исследование фторирования оксида графена в плазме SF6

Abstract

The introduction of fluorine atoms into the structure of graphene oxide (GO) due to strong C-F bonds increases its oxidative and thermal stability to temperatures of 400 0C, which is of great importance for practical applications. In the work, the fluorination of GO obtained by a modified Hammers method was carried out in a SF6 plasma in a power range from 100 to 350 W for a duration of up to 10 minutes at a gas flow rate of 50 to 100 cm3 / min. Induction and capacitive generators were used to generate the plasma.