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dc.contributor.authorSánchez, P. A.en
dc.contributor.authorVögele, M.en
dc.contributor.authorSmiatek, J.en
dc.contributor.authorQiao, B.en
dc.contributor.authorSega, M.en
dc.contributor.authorHolm, C.en
dc.date.accessioned2021-08-31T14:58:41Z-
dc.date.available2021-08-31T14:58:41Z-
dc.date.issued2019-
dc.identifier.citationAtomistic simulation of PDADMAC/PSS oligoelectrolyte multilayers: Overall comparison of tri- And tetra-layer systems / P. A. Sánchez, M. Vögele, J. Smiatek, et al. — DOI 10.1039/c9sm02010a // Soft Matter. — 2019. — Vol. 15. — Iss. 46. — P. 9437-9451.en
dc.identifier.issn1744683X-
dc.identifier.otherFinal2
dc.identifier.otherAll Open Access, Green3
dc.identifier.otherhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85075736932&doi=10.1039%2fc9sm02010a&partnerID=40&md5=620d956cf0986e1eca8d2dd5776fb2e8
dc.identifier.otherhttp://arxiv.org/pdf/1910.14506m
dc.identifier.urihttp://elar.urfu.ru/handle/10995/101656-
dc.description.abstractBy employing large-scale molecular dynamics simulations of atomistically resolved oligoelectrolytes in aqueous solutions, we study in detail the first four layer-by-layer deposition cycles of an oligoelectrolyte multilayer made of poly(diallyl dimethyl ammonium chloride)/poly(styrene sulfonate sodium salt) (PDADMAC/PSS). The multilayers are grown on a silica substrate in 0.1 M NaCl electrolyte solutions and the swollen structures are then subsequently exposed to varying added salt concentration. We investigated the microscopic properties of the films, analyzing in detail the differences between three- and four-layer systems. Our simulations provide insights into the early stages of growth of a multilayer, which are particularly challenging for experimental observations. We found rather strong complexation of the oligoelectrolytes, with fuzzy layering of the film structure. The main charge compensation mechanism is for all cases intrinsic, whereas extrinsic compensation is relatively enhanced for the layer of the last deposition cycle. In addition, we quantified other fundamental observables of these systems, such as the film thickness, water uptake, and overcharge fractions for each deposition layer. This journal is © The Royal Society of Chemistry.en
dc.format.mimetypeapplication/pdfen
dc.language.isoenen
dc.publisherRoyal Society of Chemistryen
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceSoft Matter2
dc.sourceSoft Matteren
dc.subjectDEPOSITIONen
dc.subjectELECTROLYTESen
dc.subjectMOLECULAR DYNAMICSen
dc.subjectSILICAen
dc.subjectSODIUM CHLORIDEen
dc.subjectSTYRENEen
dc.subjectATOMISTIC SIMULATIONSen
dc.subjectDEPOSITION CYCLESen
dc.subjectDEPOSITION LAYERSen
dc.subjectELECTROLYTE SOLUTIONSen
dc.subjectLARGE-SCALE MOLECULAR DYNAMICSen
dc.subjectLAYER BY LAYER DEPOSITIONen
dc.subjectMICROSCOPIC PROPERTIESen
dc.subjectPOLY(DIALLYL-DIMETHYL-AMMONIUM CHLORIDE)en
dc.subjectMULTILAYERSen
dc.titleAtomistic simulation of PDADMAC/PSS oligoelectrolyte multilayers: Overall comparison of tri- And tetra-layer systemsen
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/articleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.identifier.doi10.1039/c9sm02010a-
dc.identifier.scopus85075736932-
local.contributor.employeeSánchez, P.A., Ural Federal University, 51 Lenin av., Ekaterinburg, 620000, Russian Federation, Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf E.V., Dresden, Germany
local.contributor.employeeVögele, M., Department of Computer Science, Stanford University, Stanford, CA, United States
local.contributor.employeeSmiatek, J., Institut für Computerphysik, Universität Stuttgart, Stuttgart, 70569, Germany
local.contributor.employeeQiao, B., Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, IL, United States
local.contributor.employeeSega, M., Forschungszentrum Jülich, Helmholtz Institute Erlangen-Nuremberg, Nuremberg, Germany
local.contributor.employeeHolm, C., Institut für Computerphysik, Universität Stuttgart, Stuttgart, 70569, Germany
local.description.firstpage9437-
local.description.lastpage9451-
local.issue46-
local.volume15-
dc.identifier.wos000502539900002-
local.contributor.departmentUral Federal University, 51 Lenin av., Ekaterinburg, 620000, Russian Federation
local.contributor.departmentInstitute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf E.V., Dresden, Germany
local.contributor.departmentDepartment of Computer Science, Stanford University, Stanford, CA, United States
local.contributor.departmentInstitut für Computerphysik, Universität Stuttgart, Stuttgart, 70569, Germany
local.contributor.departmentChemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, IL, United States
local.contributor.departmentForschungszentrum Jülich, Helmholtz Institute Erlangen-Nuremberg, Nuremberg, Germany
local.identifier.pure9bfe69ca-26a6-4e77-9e1f-c41e7982464buuid
local.identifier.pure11331303-
local.identifier.eid2-s2.0-85075736932-
local.identifier.wosWOS:000502539900002-
local.identifier.pmid31720676-
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